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25 条记录 (耗时 0.036 秒)

    Radio Frequency Power Delivery System
    5.
    发明申请
    Radio Frequency Power Delivery System 有权
    射频供电系统

    公开(公告)号：US20070139122A1

    公开(公告)日：2007-06-21

    申请号：US11554979

    申请日：2006-10-31

    申请人： Siddharth Nagarkatti ,  Michael Kishinevsky ,  Ali Shajii ,  Timothy Kalvaitis ,  William McKinney ,  Daniel Goodman ,  William Holber ,  John Smith

    发明人： Siddharth Nagarkatti ,  Michael Kishinevsky ,  Ali Shajii ,  Timothy Kalvaitis ,  William McKinney ,  Daniel Goodman ,  William Holber ,  John Smith

    IPC分类号： H03F3/191

    CPC分类号： H03F1/56 ,  H03F3/191 ,  H03F3/20

    摘要： A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

    摘要翻译： 提供了一种将功率传递给动态负载的系统和方法。 该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源，用于将DC功率转换为RF功率的功率放大器，用于测量与RF功率相关联的电压和电流矢量之间的电压，电流和相位角的传感器 ，电可控阻抗匹配系统，用于将功率放大器的阻抗修改为动态负载的至少基本匹配的阻抗;以及用于控制电可控阻抗匹配系统的控制器。 该系统还包括用于确定由功率放大器输出的功率的传感器校准测量模块，用于确定输送到动态负载的功率的电子匹配系统校准模块，以及用于计算在电气可控阻抗匹配系统中消耗的功率的功率耗散模块。

    Method of providing a material processing ion beam
    6.
    发明授权
    Method of providing a material processing ion beam 失效
    提供材料处理离子束的方法

    公开(公告)号：US06818257B2

    公开(公告)日：2004-11-16

    申请号：US10246493

    申请日：2002-09-17

    申请人： Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

    发明人： Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

    IPC分类号： C23C1400

    CPC分类号： H01J27/08 ,  C23C14/0605 ,  C23C14/221 ,  C23C14/564

    摘要： Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

    摘要翻译： 公开了实现更均匀和无颗粒的DLC沉积的系统，其自动循环模式以实现碳基积累的自动去除，或者提供阻碍实现适当气体流动的障碍涉及不同的电路和设计参数选项。 一个离子源可以以两种不同的模式使用，无论是通过气流类型和速率的自动控制以及通过控制施加的功率以实现最大吞吐量或其它期望的处理目标来进行DLC沉积。 可以控制电弧，甚至允许优化实现的整体结果。

    Radio Frequency Power Delivery System
    7.
    发明申请
    Radio Frequency Power Delivery System 有权
    射频供电系统

    公开(公告)号：US20100231296A1

    公开(公告)日：2010-09-16

    申请号：US12786763

    申请日：2010-05-25

    申请人： Siddharth P. Nagarkatti ,  Michael Kishinevsky ,  Ali Shajii ,  Timothy E. Kalvaitis ,  William S. McKinney, JR. ,  Daniel Goodman ,  William M. Holber ,  John A. Smith

    发明人： Siddharth P. Nagarkatti ,  Michael Kishinevsky ,  Ali Shajii ,  Timothy E. Kalvaitis ,  William S. McKinney, JR. ,  Daniel Goodman ,  William M. Holber ,  John A. Smith

    IPC分类号： H03F1/08

    CPC分类号： H03F1/56 ,  H03F3/191 ,  H03F3/20

    摘要： A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

    摘要翻译： 提供了一种将功率传递给动态负载的系统和方法。 该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源，用于将DC功率转换为RF功率的功率放大器，用于测量与RF功率相关联的电压和电流矢量之间的电压，电流和相位角的传感器 ，电可控阻抗匹配系统，用于将功率放大器的阻抗修改为动态负载的至少基本匹配的阻抗;以及用于控制电可控阻抗匹配系统的控制器。 该系统还包括用于确定由功率放大器输出的功率的传感器校准测量模块，用于确定输送到动态负载的功率的电子匹配系统校准模块，以及用于计算在电气可控阻抗匹配系统中消耗的功率的功率耗散模块。

    Method and apparatus for preventing instabilities in radio-frequency plasma processing
    8.
    发明授权
    Method and apparatus for preventing instabilities in radio-frequency plasma processing 有权
    防止射频等离子体处理不稳定的方法和装置

    公开(公告)号：US07755300B2

    公开(公告)日：2010-07-13

    申请号：US11554996

    申请日：2006-10-31

    申请人： Michael Kishinevsky ,  Ilya Bystryak ,  Alan R. Millner

    发明人： Michael Kishinevsky ,  Ilya Bystryak ,  Alan R. Millner

    IPC分类号： G05F1/00

    CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32935 ,  H05H1/46

    摘要： A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.

    摘要翻译： 一种用于控制电源以防止由RF等离子体处理系统中的动态负载引起的不稳定的方法和装置，其工作频率为1MHz和1MHz以上。 该装置包括电源，从源极接收功率的功率转换器，功率转换器提供通过改变输入电压或开关频率中的至少一个来控​​制的恒定输出功率，以及从功率转换器接收恒定功率的RF发生器。