公开(公告)号：US10124172B2

公开(公告)日：2018-11-13

申请号：US15193927

申请日：2016-06-27

Applicant: NATIONAL UNIVERSITY OF IRELAND, GALWAY ,  Declan Lyons ,  Colin Quinn

Inventor： Declan Lyons ,  Colin Quinn ,  Gearóid Ó Laighin ,  Paul Breen ,  Brian Deegan ,  Fabio Quondamatteo

IPC: A61N1/36 ,  A61N1/04 ,  A61N1/365 ,  A61B5/0245 ,  A61B5/0205 ,  A61B5/0402 ,  A61B5/0488 ,  A61B5/00 ,  A61N1/372 ,  A61N1/378 ,  A61N1/05 ,  A61B5/11 ,  A61B5/08 ,  A61B5/024

Abstract: A monitoring system has biomechanical sensors, physiological sensors and a controller which receive sensory inputs from the sensors to provide output signals for the output device, and it detects from the sensory inputs risk of a syncopal event The bio-mechanical sensors include sensors arranged to allow the processor to detect a user postures and posture transitions. The processor operates a finite state machine, in which there is a state corresponding to each of a plurality of user physical postures and to each of a plurality of transitions between said postures, and the processor determines a relevant state depending on the sensory inputs. A device output may be muscle stimulation to prevent syncope, and there are stimulation permissions associated with the finite state machine states.

公开(公告)号：US07241360B2

公开(公告)日：2007-07-10

申请号：US10126132

申请日：2002-04-19

Applicant: Andrew Shabalin ,  Colin Quinn ,  Michael Kishinevski

Inventor： Andrew Shabalin ,  Colin Quinn ,  Michael Kishinevski

IPC: H01L21/306 ,  C23C16/00 ,  C23C14/00 ,  H01J7/24

CPC classification number: C23C16/50 ,  H01J27/143 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/31

Abstract: There is provided by this invention a unique ion source for depositing thin films on a substrate in a vacuum chamber that neutralizes the positive electric charges that develop on the substrate and vacuum chamber apparatus that may cause arcing and degradation of the film deposition. A power supply with a reversing voltage waveform is utilized that neutralizes the electric charge on the substrate and the vacuum chamber apparatus. A power supply applies an ac voltage to the anode of the ion source and a rectified ac voltage to the cathode. The ground terminal of the power supply is connected to the vacuum chamber. The rectifying circuit is comprised of zener diodes that clamp the voltage in the circuit from spikes during plasma ignition and a capacitor connected to negatively bias the cathode when there is no plasma discharge.

Abstract translation: 本发明提供了一种用于在真空室中的衬底上沉积薄膜的独特的离子源，该真空室中和在基板和真空室装置上形成的正电荷，这可能导致成膜和电沉积的劣化。 利用具有反转电压波形的电源，其中和基板和真空室装置上的电荷。 电源向离子源的阳极施加交流电压，并向阴极施加整流的交流电压。 电源的接地端子连接到真空室。 整流电路包括齐纳二极管，其在等离子体点火期间钳位电路中的电压，并且在不存在等离子体放电时将电容器连接到负极偏置阴极。

公开(公告)号：US20050098118A1

公开(公告)日：2005-05-12

申请号：US10990649

申请日：2004-11-16

Applicant: Michael Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

Inventor： Michael Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

IPC: C23C14/06 ,  C23C14/22 ,  C23C14/56 ,  H01J27/08 ,  C23C16/00 ,  H01L21/338

CPC classification number: H01J27/08 ,  C23C14/0605 ,  C23C14/221 ,  C23C14/564

Abstract: Apparatus to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract translation: 公开了实现更均匀和无颗粒的DLC沉积的装置，其自动循环以实现碳基积累的自动去除，或提供阻碍实现适当气体流动的障碍，其涉及不同的电路和设计参数选项。 一个离子源可以以两种不同的模式使用，无论是通过气流类型和速率的自动控制以及通过控制施加的功率以实现最大吞吐量或其它期望的处理目标来进行DLC沉积。 可以控制电弧，甚至允许优化实现的整体结果。

公开(公告)号：US06451389B1

公开(公告)日：2002-09-17

申请号：US09551169

申请日：2000-04-17

Applicant: Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

Inventor： Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

IPC: H05H124

CPC classification number: H01J27/08 ,  C23C14/0605 ,  C23C14/221 ,  C23C14/564

Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract translation: 公开了实现更均匀和无颗粒的DLC沉积的系统，其自动循环模式以实现碳基积累的自动去除，或者提供阻碍实现适当气体流动的障碍涉及不同的电路和设计参数选项。 一个离子源可以以两种不同的模式使用，无论是通过气流类型和速率的自动控制以及通过控制施加的功率以实现最大吞吐量或其它期望的处理目标来进行DLC沉积。 可以控制电弧，甚至允许优化实现的整体结果。

公开(公告)号：US20160331974A1

公开(公告)日：2016-11-17

申请号：US15193927

申请日：2016-06-27

Applicant: Declan LYONS ,  Colin QUINN ,  NATIONAL UNIVERSITY OF IRELAND, GALWAY

Inventor： Declan LYONS ,  Colin QUINN ,  Gearóid Ó LAIGHIN ,  Paul BREEN ,  Brian DEEGAN ,  Fabio QUONDAMATTEO

IPC: A61N1/36 ,  A61N1/05 ,  A61N1/378 ,  A61N1/04

CPC classification number: A61N1/36139 ,  A61B5/0205 ,  A61B5/024 ,  A61B5/0245 ,  A61B5/0402 ,  A61B5/0488 ,  A61B5/08 ,  A61B5/0816 ,  A61B5/1116 ,  A61B5/1117 ,  A61B5/1123 ,  A61B5/7275 ,  A61B2562/0219 ,  A61N1/0452 ,  A61N1/0456 ,  A61N1/0484 ,  A61N1/0556 ,  A61N1/36003 ,  A61N1/36014 ,  A61N1/3606 ,  A61N1/365 ,  A61N1/36535 ,  A61N1/36542 ,  A61N1/37229 ,  A61N1/3787

Abstract: A monitoring system has biomechanical sensors, physiological sensors and a controller which receive sensory inputs from the sensors to provide output signals for the output device, and it detects from the sensory inputs risk of a syncopal event The bio-mechanical sensors include sensors arranged to allow the processor to detect a user postures and posture transitions. The processor operates a finite state machine, in which there is a state corresponding to each of a plurality of user physical postures and to each of a plurality of transitions between said postures, and the processor determines a relevant state depending on the sensory inputs. A device output may be muscle stimulation to prevent syncope, and there are stimulation permissions associated with the finite state machine states.

Abstract translation: 监测系统具有生物力学传感器，生理传感器和控制器，其接收来自传感器的感觉输入以为输出设备提供输出信号，并且其从感觉输入端检测到晕厥事件的风险。生物机械传感器包括传感器，其布置成允许 处理器检测用户姿势和姿势转换。 处理器操作有限状态机，其中存在对应于多个用户身体姿势中的每一个以及所述姿势之间的多个转换中的每一个的状态，并且处理器根据感觉输入来确定相关状态。 设备输出可以是肌肉刺激以防止晕厥，并且存在与有限状态机状态相关联的刺激许可。

公开(公告)号：US06818257B2

公开(公告)日：2004-11-16

申请号：US10246493

申请日：2002-09-17

Applicant: Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

Inventor： Michael S. Amann ,  Michael Kishinevsky ,  Andrew Shabalin ,  Colin Quinn

IPC: C23C1400

CPC classification number: H01J27/08 ,  C23C14/0605 ,  C23C14/221 ,  C23C14/564

Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract translation: 公开了实现更均匀和无颗粒的DLC沉积的系统，其自动循环模式以实现碳基积累的自动去除，或者提供阻碍实现适当气体流动的障碍涉及不同的电路和设计参数选项。 一个离子源可以以两种不同的模式使用，无论是通过气流类型和速率的自动控制以及通过控制施加的功率以实现最大吞吐量或其它期望的处理目标来进行DLC沉积。 可以控制电弧，甚至允许优化实现的整体结果。