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公开(公告)号：US09597769B2
公开(公告)日：2017-03-21
申请号：US13488149
申请日：2012-06-04
申请人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
发明人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
CPC分类号： B24B37/205 , B24B37/16 , B24B37/22 , B24B37/26 , B24D11/003 , B24D18/0009
摘要： Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a global top surface and a transparent region. A polishing surface layer is attached to the global top surface of the foundation layer. The polishing surface layer has a polishing surface and a back surface. An aperture is disposed in the polishing pad from the back surface through to the polishing surface of the polishing surface layer, and aligned with the transparent region of the foundation layer. The foundation layer provides an impermeable seal for the aperture at the back surface of the polishing surface layer. Methods of fabricating such polishing pads are also described.
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公开(公告)号：US20160221145A1
公开(公告)日：2016-08-04
申请号：US14611064
申请日：2015-01-30
申请人： Ping Huang , William C. Allison , Richard Frentzel , Paul Andre Lefevre , Robert Kerprich , Diane Scott
发明人： Ping Huang , William C. Allison , Richard Frentzel , Paul Andre Lefevre , Robert Kerprich , Diane Scott
CPC分类号： B24B37/24 , B24B37/205 , B24B37/26 , C08J9/0061 , C08J9/228 , C08J2333/00 , C08J2375/04 , C08J2433/00 , C08J2475/04
摘要： Low density polishing pads and methods of fabricating low density polishing pads are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a density approximately in the range of 0.4-0.55 g/cc. The polishing body includes a thermoset polyurethane material and a plurality of closed cell pores dispersed in the thermoset polyurethane material. Each of the plurality of closed cell pores has a shell composed of an acrylic co-polymer.
摘要翻译： 描述低密度抛光垫和制造低密度抛光垫的方法。 在一个实例中，用于抛光衬底的抛光垫包括密度大约在0.4-0.55g / cc范围内的抛光体。 抛光体包括热固性聚氨酯材料和分散在热固性聚氨酯材料中的多个闭孔。 多个闭孔细孔中的每一个具有由丙烯酸共聚物构成的壳。
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公开(公告)号：US09238294B2
公开(公告)日：2016-01-19
申请号：US14307846
申请日：2014-06-18
CPC分类号： B24B37/24 , B24B37/205 , B24B37/26 , B24D3/32
摘要： Polishing pads having porogens with liquid filler and methods of fabricating polishing pads having porogens with liquid filler are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a polymer matrix and a plurality of porogens dispersed throughout the polymer matrix. Each of the plurality of porogens has a shell with a liquid filler. The liquid filler has a boiling point less than 100 degrees Celsius at a pressure of 1 atm, a density less than water, or both.
摘要翻译： 描述了具有带有液体填料的致孔剂的抛光垫和用液体填料制造具有致孔剂的抛光垫的方法。 在一个实例中，用于抛光衬底的抛光垫包括具有分散在整个聚合物基体中的聚合物基质和多个致孔剂的抛光体。 多个致孔剂中的每一个具有带有液体填料的壳。 液体填充剂的沸点低于100摄氏度，压力为1个大气压，密度小于水或两者。
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公开(公告)号：US09067298B2
公开(公告)日：2015-06-30
申请号：US13306849
申请日：2011-11-29
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
摘要翻译： 描述具有开槽基础层和抛光表面层的抛光垫。 在一个示例中，用于抛光衬底的抛光垫包括其中布置有凹槽图案的基础层。 连续的抛光表面层附着到基础层的凹槽的图案上。 在另一个实例中，用于抛光衬底的抛光垫包括具有设置在其上的突起图案的表面的基础层。 每个突起具有顶表面和侧壁。 不连续的抛光表面层附着到基础层上并且包括离散的部分。 每个离散部分附接到基础层的相应的一个突起的顶表面。 还描述了制造具有与沟槽基础层结合的抛光表面层的抛光垫的方法。
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公开(公告)号：US20150367478A1
公开(公告)日：2015-12-24
申请号：US14307846
申请日：2014-06-18
CPC分类号： B24B37/24 , B24B37/205 , B24B37/26 , B24D3/32
摘要： Polishing pads having porogens with liquid filler and methods of fabricating polishing pads having porogens with liquid filler are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a polymer matrix and a plurality of porogens dispersed throughout the polymer matrix. Each of the plurality of porogens has a shell with a liquid filler. The liquid filler has a boiling point less than 100 degrees Celsius at a pressure of 1 atm, a density less than water, or both.
摘要翻译： 描述了具有带有液体填料的致孔剂的抛光垫和用液体填料制造具有致孔剂的抛光垫的方法。 在一个实例中，用于抛光衬底的抛光垫包括具有分散在整个聚合物基体中的聚合物基质和多个致孔剂的抛光体。 多个致孔剂中的每一个具有带有液体填料的壳。 液体填充剂的沸点低于100摄氏度，压力为1个大气压，密度小于水或两者。
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公开(公告)号：US20150273656A1
公开(公告)日：2015-10-01
申请号：US14736568
申请日：2015-06-11
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
摘要翻译： 描述了具有基础层和抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括基础层。 抛光表面层结合到基础层。 还描述了制造具有结合到基础层的抛光表面层的抛光垫的方法。
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公开(公告)号：US20150273655A1
公开(公告)日：2015-10-01
申请号：US14732497
申请日：2015-06-05
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
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公开(公告)号：US20150266160A1
公开(公告)日：2015-09-24
申请号：US14727586
申请日：2015-06-01
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
摘要翻译： 描述具有开槽基础层和抛光表面层的抛光垫。 在一个示例中，用于抛光衬底的抛光垫包括其中布置有凹槽图案的基础层。 连续的抛光表面层附着到基础层的凹槽的图案上。 在另一个实例中，用于抛光衬底的抛光垫包括具有设置在其上的突起图案的表面的基础层。 每个突起具有顶表面和侧壁。 不连续的抛光表面层附着到基础层上并且包括离散的部分。 每个离散部分附接到基础层的相应的一个突起的顶表面。 还描述了制造具有与沟槽基础层结合的抛光表面层的抛光垫的方法。
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公开(公告)号：US09067297B2
公开(公告)日：2015-06-30
申请号：US13306845
申请日：2011-11-29
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
摘要翻译： 描述了具有基础层和抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括基础层。 抛光表面层结合到基础层。 还描述了制造具有结合到基础层的抛光表面层的抛光垫的方法。
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10.发明申请POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OPENING ABOVE A TRANSPARENT FOUNDATION LAYER 有权具有抛光表面的抛光垫具有透气性或开放于透明的基础层公开(公告)号：US20130324020A1
公开(公告)日：2013-12-05
申请号：US13488149
申请日：2012-06-04
申请人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
发明人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
CPC分类号： B24B37/205 , B24B37/16 , B24B37/22 , B24B37/26 , B24D11/003 , B24D18/0009
摘要： Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a global top surface and a transparent region. A polishing surface layer is attached to the global top surface of the foundation layer. The polishing surface layer has a polishing surface and a back surface. An aperture is disposed in the polishing pad from the back surface through to the polishing surface of the polishing surface layer, and aligned with the transparent region of the foundation layer. The foundation layer provides an impermeable seal for the aperture at the back surface of the polishing surface layer. Methods of fabricating such polishing pads are also described.
摘要翻译： 描述具有在透明基底层上方具有开口或开口的抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括具有全局顶表面和透明区域的基础层。 抛光表面层附着到基础层的全局顶表面上。 抛光表面层具有抛光表面和后表面。 在抛光垫中从研磨表面层的后表面到抛光表面设置孔，并与基底层的透明区域对齐。 基础层为抛光表面层的后表面处的孔提供不可渗透的密封。 还描述了制造这种抛光垫的方法。
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