High resolution multi-lens imaging device
    1.
    发明申请
    High resolution multi-lens imaging device 失效
    高分辨率多镜头成像装置

    公开(公告)号:US20050068632A1

    公开(公告)日:2005-03-31

    申请号:US10670679

    申请日:2003-09-25

    IPC分类号: G02B13/06 H04N5/225 G02B27/10

    摘要: An imaging device (30) can include a plurality of lenses (51, 52, 53, 54) mounted on a multi-dimensional support structure (32), a plurality of optical detectors (40) corresponding to the plurality of lenses for capturing an optical signal from at least two lenses among the plurality of lenses, and a processor (34) for combining the optical signal from at least two lenses to form an image and electronically controlling the field of view and a resolution of the image. The plurality of lenses each can include an array of sub-wavelength apertures or a plurality of photon sieve lenses (36).

    摘要翻译: 成像装置(30)可以包括安装在多维支撑结构(32)上的多个透镜(51,52,53,54),对应于多个透镜的多个光学检测器(40),用于捕获 来自多个透镜中的至少两个透镜的光信号以及用于组合来自至少两个透镜的光信号以形成图像并且电子地控制图像的视场和分辨率的处理器(34)。 多个透镜各自可以包括亚波长孔径阵列或多个光子筛透镜(36)。

    PHOTOTHERAPY BANDAGE
    2.
    发明申请
    PHOTOTHERAPY BANDAGE 审中-公开
    照片贴

    公开(公告)号:US20080058689A1

    公开(公告)日:2008-03-06

    申请号:US11860143

    申请日:2007-09-24

    IPC分类号: A61N5/06 A61F13/00

    摘要: A phototherapy bandage capable of providing radiation to a localized area of a patient for accelerating would healing and pain relief, photodynamic therapy, and for aesthetic applications. The phototherapy bandage may include a flexible light source that is continuous across the bandage for providing a selected light, such as a visible light, a near-infrared light, or other light, having substantially similar intensity across the bandage. The bandage may also be flexible and capable of being attached to a patient without interfering with the patient's daily routine. The phototherapy bandage may easily conform to the curves of a patient and may come in a variety of exterior shapes and sizes.

    摘要翻译: 能够向患者的局部区域提供辐射以加速的光疗绷带可以治愈和缓解疼痛,光动力治疗和美学应用。 光疗绷带可以包括在绷带上连续的柔性光源,以提供在整个绷带上具有基本类似强度的所选择的光,例如可见光,近红外光或其他光。 绷带也可以是柔性的并能够连接到患者而不干扰患者的日常生活。 光疗绷带可以容易地符合患者的曲线,并且可以具有各种外形和尺寸。

    Back-gated field emission electron source
    3.
    发明申请
    Back-gated field emission electron source 有权
    后门控场发射电子源

    公开(公告)号:US20080067494A1

    公开(公告)日:2008-03-20

    申请号:US11904938

    申请日:2007-09-28

    IPC分类号: H01L29/06

    摘要: A field emitter device consistent with certain embodiments has a substantially planar conductor forming a gate electrode. A conductive stripe forms a cathode on the insulating layer. An insulating layer covers at least a portion of the surface between the cathode and the gate. An anode is positioned above the cathode. An emitter structure, for example of carbon nanotubes is disposed on a surface of the cathodes closest to the anode. When an electric field is generated across the insulating layer, the cathode/emitter structure has a combination of work function and aspect ratio that causes electron emission from the emitter structure toward the anode at a field strength that is lower than that which causes emissions from other regions of the cathode. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

    摘要翻译: 与某些实施例一致的场发射器件具有形成栅电极的基本上平面的导体。 导电条在绝缘层上形成阴极。 绝缘层覆盖阴极和栅极之间的表面的至少一部分。 阳极位于阴极上方。 例如碳纳米管的发射极结构设置在最靠近阳极的阴极的表面上。 当跨绝缘层产生电场时,阴极/发射极结构具有功函数和纵横比的组合,其导致电子从发射极结构向阳极发射的场强低于引起来自其它辐射的场强 阴极的区域。 该摘要不被认为是限制性的,因为其他实施例可能偏离本摘要中描述的特征。

    Back-gated field emission electron source
    4.
    发明申请
    Back-gated field emission electron source 审中-公开
    后门控场发射电子源

    公开(公告)号:US20050116214A1

    公开(公告)日:2005-06-02

    申请号:US10974895

    申请日:2004-10-27

    IPC分类号: H01J3/02 H01J9/02 H01L29/06

    摘要: A field emitter device consistent with certain embodiments has a substantially planar conductor forming a gate electrode. A conductive stripe forms a cathode on the insulating layer. An insulating layer covers at least a portion of the surface between the cathode and the gate. An anode is positioned above the cathode. An emitter structure, for example of carbon nanotubes is disposed on a surface of the cathodes closest to the anode. When an electric field is generated across the insulating layer, the cathode/emitter structure has a combination of work function and aspect ratio that causes electron emission from the emitter structure toward the anode at a field strength that is lower than that which causes emissions from other regions of the cathode. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

    摘要翻译: 与某些实施例一致的场发射器件具有形成栅电极的基本上平面的导体。 导电条在绝缘层上形成阴极。 绝缘层覆盖阴极和栅极之间的表面的至少一部分。 阳极位于阴极上方。 例如碳纳米管的发射极结构设置在最靠近阳极的阴极的表面上。 当跨绝缘层产生电场时,阴极/发射极结构具有功函数和纵横比的组合,其导致电子从发射极结构向阳极发射的场强低于引起来自其它辐射的场强 阴极的区域。 该摘要不被认为是限制性的,因为其他实施例可能偏离本摘要中描述的特征。

    Imaging devices and methods
    5.
    发明申请
    Imaging devices and methods 失效
    成像设备和方法

    公开(公告)号:US20050046944A1

    公开(公告)日:2005-03-03

    申请号:US10911926

    申请日:2004-08-05

    IPC分类号: G02B27/44 G06K9/40

    摘要: An imaging device consistent with one of numerous embodiments has an opaque planar sheet with a plurality of pinholes defining a photon sieve in the sheet, wherein, the photon sieve comprises at least first and second regions. The first region exhibits a first focal length, a first field of view, a first transmissivity, a first resolution and a first wavelength, and the second region exhibiting a second focal length, a second field of view, a second transmissivity, a second resolution and a second wavelength. At least one of the first focal length, the first wavelength, the first transmissivity, the first resolution and the first field of view is different from the second focal length, the second wavelength, the second transmissivity, the second resolution and the second field of view. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

    摘要翻译: 与许多实施例之一相一致的成像装置具有不透明平板,其具有在片材中限定光子筛的多个针孔,其中,光子筛包括至少第一和第二区域。 第一区域呈现第一焦距,第一视场,第一透射率,第一分辨率和第一波长,第二区域呈现第二焦距,第二视场,第二透射率,第二分辨率 和第二波长。 第一焦距,第一波长,第一透射率,第一分辨率和第一视场中的至少一个不同于第二焦距,第二波长,第二透射率,第二分辨率和第二场 视图。 该摘要不被认为是限制性的,因为其他实施例可能偏离本摘要中描述的特征。

    Phototherapy bandage
    6.
    发明授权
    Phototherapy bandage 失效
    光疗绷带

    公开(公告)号:US07304201B2

    公开(公告)日:2007-12-04

    申请号:US10732086

    申请日:2003-12-10

    IPC分类号: A61F13/00

    摘要: A phototherapy bandage capable of providing radiation to a localized area of a patient for accelerating wound healing and pain relief, photodynamic therapy, and for aesthetic applications. The phototherapy bandage may include a flexible light source that is continuous across the bandage for providing a selected light, such as a visible light, a near-infrared light, or other light, having substantially similar intensity across the bandage. The bandage may also be flexible and capable of being attached to a patient without interfering with the patient's daily routine. The phototherapy bandage may easily conform to the curves of a patient and may come in a variety of exterior shapes and sizes.

    摘要翻译: 光疗绷带能够向患者的局部区域提供辐射,以加速伤口愈合和疼痛缓解,光动力疗法和美学应用。 光疗绷带可以包括在绷带上连续的柔性光源,以提供在整个绷带上具有基本类似强度的所选择的光,例如可见光,近红外光或其他光。 绷带也可以是柔性的并能够连接到患者而不干扰患者的日常生活。 光疗绷带可以容易地符合患者的曲线,并且可以具有各种外形和尺寸。

    Pulsed dielectric barrier discharge

    公开(公告)号:US20060244386A1

    公开(公告)日:2006-11-02

    申请号:US11120153

    申请日:2005-05-02

    IPC分类号: H01J7/24

    摘要: A dielectric barrier plasma discharge device consistent with certain embodiments of the present invention has a pair of electrodes spaced apart by an electrode gap. A dielectric is disposed between the electrodes. The electrode gap is provided with a gas at a specified pressure. A rapid rise time voltage pulse generator produces a voltage pulse across the electrodes to cause an extreme overvoltage condition, wherein the rapid rise time is less than a plasma generation time so that the extreme overvoltage condition occurs prior to current flow across the electrode gap. Due to the high voltages and high current densities, the product yields an extremely high instantaneous power density. This extreme overvoltage condition is also believed to lead to production of shock waves and runaway free electrons. The resulting plasma can be utilized to carry out many potential tasks including, but not limited to etching, deposition, and sterilization. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.