Planar motor initialization method, planar motro, lithographic apparatus and device manufacturing method
    1.
    发明申请
    Planar motor initialization method, planar motro, lithographic apparatus and device manufacturing method 有权
    平面电动机初始化方法,平面机构,光刻设备和装置制造方法

    公开(公告)号:US20050285550A1

    公开(公告)日:2005-12-29

    申请号:US10874691

    申请日:2004-06-24

    摘要: A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic field. In operation, the phase of each current flowing through each coil determines the direction of a force generated due to the current in the magnetic field. For correct operation, the phase angle of each current is to be adapted to the local direction of the magnetic field by determining a commutation-offset angle. The commutation-offset angle is determined by generating a force in an unknown direction and varying the commutation-angle, and determining when the generated force is directed perpendicular to the magnet plate, while ensuring that the generated force does not exceed a horizontal friction force. By determining a maximum compression of end stops of the coil assembly, or determining a maximum pressure, it may be determined when the generated force is directed perpendicular to the magnet plate.

    摘要翻译: 通过向线圈组件提供三相交流电来控制平面电动机。 每相提供给三个线圈中的一个。 线圈位于由其表面上具有交替磁极的磁板产生的磁场中,用于产生交变磁场。 在操作中,流过每个线圈的每个电流的相位确定由于磁场中的电流而产生的力的方向。 为了正确的操作,通过确定换向偏移角度,每个电流的相位角将适应于磁场的局部方向。 通过产生未知方向的力并改变换向角来确定换向偏移角,并且确定所产生的力何时垂直于磁体板定向,同时确保所产生的力不超过水平摩擦力。 通过确定线圈组件的端部止动件的最大压缩或确定最大压力,可以确定何时生成的力垂直于磁体板定向。

    Lithographic apparatus and device manufacturing method
    3.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20060077364A1

    公开(公告)日:2006-04-13

    申请号:US10961391

    申请日:2004-10-12

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70725

    摘要: To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

    摘要翻译: 为了实现光刻设备的图形支撑件或基板台的高加速度和高移动速度,图案支撑件和基板台之一由用于较大位移的致动器支撑,而省略了用于精确定位的致动器。 图案支撑件和衬底台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 图案形成装置和基板的对准精度通过提供一种控制系统来实现,该控制系统适于将图案支撑件和基板台中的另一个定位成使得图案支撑件和基板台之一的定位误差为 通过另一个的定位来补偿。