公开(公告)号：US07078708B2

公开(公告)日：2006-07-18

申请号：US10744092

申请日：2003-12-24

申请人： Pertrus Rutgerus Bartray ,  Mustafa Amhaouch ,  Angelo Alexander Michael Van Engelen ,  Paulus Martinus Maria Liebregts ,  Tim Anton Johan Meesters ,  Franciscus Catharina Bernardus Marinus Van Vroonhoven

发明人： Pertrus Rutgerus Bartray ,  Mustafa Amhaouch ,  Angelo Alexander Michael Van Engelen ,  Paulus Martinus Maria Liebregts ,  Tim Anton Johan Meesters ,  Franciscus Catharina Bernardus Marinus Van Vroonhoven

IPC分类号： G03B27/68

CPC分类号： H01J37/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70841 ,  G03F7/70916 ,  H01J37/3174

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统。 光刻设备还包括：用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予所述光束图案; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻设备包括其中存在至少照明系统和衬底台的真空系统。 真空系统包括至少两个单独的真空模块。 第一真空模块至少包括投影系统和/或照明系统。 第二真空模块包括基板台。 至少两个真空模块通过可关闭的连接相互连接。

公开(公告)号：US07554105B2

公开(公告)日：2009-06-30

申请号：US11263012

申请日：2005-11-01

申请人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

公开(公告)号：US07049592B2

公开(公告)日：2006-05-23

申请号：US10615421

申请日：2003-07-09

申请人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K7/00 ,  G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

公开(公告)号：US07061579B2

公开(公告)日：2006-06-13

申请号：US10735847

申请日：2003-12-16

申请人： Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer

发明人： Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10−6/K.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统以及提供参考表面的参考框架，基准面相对于基板的至少一个基板 并且测量图案结构。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US06977713B2

公开(公告)日：2005-12-20

申请号：US10729376

申请日：2003-12-08

申请人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70858

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，构造成支撑图案形成装置的支撑结构，其用于使投影光束在其横截面上具有图案，用于保持衬底的衬底台，用于保持衬底的突起 将图案化光束投影到基板的目标部分上的系统，以及具有位置传感器并且基板位于其上的参考框架。 该装置还包括具有加热元件的热​​传输系统，其与投影系统和参考框架中的至少一个进行热相互作用，用于传输到投影系统和参考框架中的至少一个的热传递，其中热量 传输系统耦合到与参考系机械隔离的另一帧。