公开(公告)号：US20140080058A1

公开(公告)日：2014-03-20

申请号：US14027324

申请日：2013-09-16

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： James F. CAMERON ,  Vipul JAIN ,  Paul J. LaBEAUME ,  Jin Wuk SUNG ,  James W. THACKERAY

IPC: G03F7/027 ,  G03F7/20

CPC classification number: C07D333/76 ,  C07C309/17 ,  C07C315/00 ,  C07C2603/86 ,  C07D333/46 ,  C08F12/30 ,  C08F220/24 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/32

Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

Abstract translation: 提供了特别可用作光致抗蚀剂组合物组分的酸发生剂化合物。 优选的酸产生剂包括包含共价连接的酸不稳定基团的环状锍化合物。

公开(公告)号：US20140080062A1

公开(公告)日：2014-03-20

申请号：US14027400

申请日：2013-09-16

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： James W. THACKERAY ,  Jin Wuk SUNG ,  Paul J. LaBEAUME ,  Vipul JAIN

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20

Abstract: The present invention relates to new photoresist compositions that comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups.

Abstract translation: 本发明涉及新的光致抗蚀剂组合物，其包含（a）包含与其结合的酸产生剂的聚合物; 和（b）不与聚合物键合并且包含一个或多个酸不稳定基团的酸产生剂化合物。

公开(公告)号：US20210108065A1

公开(公告)日：2021-04-15

申请号：US16653690

申请日：2019-10-15

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Yang SONG ,  Jong Keun PARK ,  Emad AQAD ,  Mingqi LI ,  Colin LIU ,  James W. THACKERAY ,  Peter TREFONAS, III

IPC: C08L33/08 ,  C08L25/14 ,  G03F7/038 ,  G03F7/20

Abstract: A polymer comprising: a first repeating unit comprising a tertiary ester acid labile group; and a second repeating unit of Formula (1): wherein R1 to R5 are as provided herein; R2 and R3 together do not form a ring; each A is independently a halogen, a carboxylic acid or ester, a thiol, a straight chain or branched C1-20 alkyl, a monocyclic or polycyclic C3-20 cycloalkyl, a monocyclic or polycyclic C3-20 fluorocycloalkenyl, a monocyclic or polycyclic C3-20 heterocycloalkyl, a monocyclic or polycyclic C6-20 aryl, or a monocyclic or polycyclic C4-20 heteroaryl, each of which is substituted or unsubstituted; and m is an integer of 0 to 4.

公开(公告)号：US20140186767A1

公开(公告)日：2014-07-03

申请号：US13730273

申请日：2012-12-28

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： James W. THACKERAY ,  Paul J. LaBEAUME ,  James F. CAMERON

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397

Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.

Abstract translation: 提供了特别可用作光致抗蚀剂组合物组分的酸发生剂化合物。 在一个优选的方面，提供光致抗蚀剂，其包含（i）聚合物; （ii）第一鎓盐酸产生剂，其在将光致抗蚀剂组合物暴露于活化辐射时产生第一种酸; 和（iii）第二鎓盐酸发生剂，其1）包含共价结合的酸不稳定部分，和2）在将光致抗蚀剂组合物暴露于活化辐射时产生第二种酸，其中第一种酸和第二种酸具有不同的pKa值 至少0.5。