DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES
    3.
    发明申请
    DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES 有权
    透明化合物,光电组合物和制造电子器件的方法

    公开(公告)号:US20140186770A1

    公开(公告)日:2014-07-03

    申请号:US14145551

    申请日:2013-12-31

    Abstract: Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices.

    Abstract translation: 提供树枝状化合物。 树枝状化合物包括具有阴离子基团和连接基团的焦点的阴离子树突,以及光反应性阳离子。 树枝状化合物特别用作光致酸发生剂。 还提供了包括这种树枝状化合物的光致抗蚀剂组合物,以及用光致抗蚀剂组合物形成电子器件的方法。 树枝状化合物,光致抗蚀剂组合物和方法在半导体器件的制造中特别适用。

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