公开(公告)号：US12054427B2

公开(公告)日：2024-08-06

申请号：US17329377

申请日：2021-05-25

Applicant: RTX Corporation

Inventor： Richard Wesley Jackson ,  James T. Beals ,  Xia Tang ,  David A. Litton ,  Elisa M. Zaleski ,  Brian T. Hazel

IPC: C04B35/48 ,  C04B35/622 ,  C04B41/00 ,  C04B41/45 ,  C04B41/50 ,  C04B41/87 ,  C23C4/04 ,  C23C4/134

CPC classification number: C04B35/481 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4543 ,  C04B41/5044 ,  C04B41/87 ,  C23C4/04 ,  C23C4/134 ,  C04B2235/3244 ,  C04B2235/3248 ,  C04B2235/3427 ,  C04B2235/36 ,  C04B2235/96

Abstract: An environmental barrier coating includes a barrier layer which includes a matrix, diffusive particles, and gettering particles; and a calcium-magnesia alumina-silicate (CMAS)-resistant component. The CMAS-resistant component includes hafnium silicate and a rare earth hafnate. An article and a method of fabricating an article are also disclosed.

公开(公告)号：US12065382B2

公开(公告)日：2024-08-20

申请号：US17314670

申请日：2021-05-07

Applicant: RTX CORPORATION

Inventor： Richard Wesley Jackson ,  James T. Beals ,  Xia Tang ,  David A. Litton ,  Elisa M. Zaleski ,  Brian T. Hazel

IPC: C04B35/48 ,  C04B35/622 ,  C04B41/00 ,  C04B41/45 ,  C04B41/50 ,  C04B41/87 ,  C23C4/04 ,  C23C4/10 ,  C23C4/134

CPC classification number: C04B35/481 ,  C04B41/009 ,  C04B41/4543 ,  C04B41/5044 ,  C04B41/87 ,  C23C4/10 ,  C23C4/134 ,  C04B2235/3248 ,  C04B2235/3427 ,  C04B2235/9669

Abstract: An environmental barrier coating includes a barrier layer which includes a matrix, diffusive particles, and gettering particles; and a calcium-magnesia alumina-silicate (CMAS)-resistant component. The CMAS-resistant component includes hafnium silicate and a rare earth hafnate. An article and a method of fabricating an article are also disclosed.

公开(公告)号：US20240052476A1

公开(公告)日：2024-02-15

申请号：US18233582

申请日：2023-08-14

Applicant: RTX Corporation

Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

IPC: C23C14/30 ,  C23C14/24 ,  C23C14/22 ,  C23C14/50

CPC classification number: C23C14/30 ,  C23C14/243 ,  C23C14/228 ,  C23C14/246 ,  C23C14/505

Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

公开(公告)号：US20240044011A1

公开(公告)日：2024-02-08

申请号：US18229338

申请日：2023-08-02

Applicant: RTX Corporation

Inventor： David A. Litton ,  Brian T. Hazel ,  Alan C. Barron

IPC: C23C28/04 ,  C23C4/134 ,  C23C4/11

CPC classification number: C23C28/04 ,  C23C4/134 ,  C23C4/11 ,  C25D13/02

Abstract: A method of applying a top coat to an article according to an exemplary embodiment of this disclosure, among other possible things includes applying a first feedstock comprising particles of oxide-based material having diameters between about 1 and about 80 microns via a thermal spray process to form a first top coat layer on an article having a bond coat and applying a second feedstock comprising particles of oxide-based material having diameters between about 15 and about 60 microns via the thermal spray process to form a second top coat layer on the first top coat layer. An article and a barrier layer for an article are also disclosed.

公开(公告)号：US12227832B2

公开(公告)日：2025-02-18

申请号：US18233582

申请日：2023-08-14

Applicant: RTX Corporation

Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

IPC: C23C14/30 ,  C23C14/22 ,  C23C14/24 ,  C23C14/50

Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

公开(公告)号：US20240068102A1

公开(公告)日：2024-02-29

申请号：US18385204

申请日：2023-10-30

Applicant: RTX Corporation

Inventor： James W. Neal ,  David A. Litton ,  Brian T. Hazel ,  Michael J. Maloney ,  Eric M. Jorzik

IPC: C23C16/46 ,  C23C14/08 ,  C23C14/22 ,  C23C14/50 ,  C23C14/56 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/463 ,  C23C14/083 ,  C23C14/22 ,  C23C14/50 ,  C23C14/505 ,  C23C14/56 ,  C23C14/566 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C14/30

Abstract: A deposition apparatus comprises: an infeed chamber; a preheat chamber; a deposition chamber; and optionally at least one of a cooldown chamber and an outlet chamber. At least a first of the preheat chamber and the cooldown chamber contains a buffer system for buffering workpieces respectively passing to or from the deposition chamber.