公开(公告)号：US20110240610A1

公开(公告)日：2011-10-06

申请号：US13159266

申请日：2011-06-13

申请人： Randall S. Mundt ,  Paul D. MacDonald ,  Andrew Beers ,  Mason L. Freed ,  Costas J. Spanos

发明人： Randall S. Mundt ,  Paul D. MacDonald ,  Andrew Beers ,  Mason L. Freed ,  Costas J. Spanos

IPC分类号： B23K10/00

CPC分类号： G01N27/60 ,  G01K7/25 ,  G01N33/0004 ,  G01R15/24 ,  G01R29/12 ,  H01L21/67248 ,  H01L21/67253 ,  H01L2924/0002 ,  H01L2924/00

摘要： A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.

摘要翻译： 一种用于测量用于处理工件的等离子体工艺参数的传感器装置。 传感器装置包括基座，支撑在基座上或底座中的信息处理器以及支撑在基座上或基座中的至少一个传感器。 所述至少一个传感器包括被配置用于测量等离子体的电性能的至少一个感测元件，并且可以包括耦合到所述至少一个感测元件的换能器。 换能器可被配置为从感测元件接收信号并将信号转换成第二信号以输入到信息处理器。

公开(公告)号：US07722434B2

公开(公告)日：2010-05-25

申请号：US11392220

申请日：2006-03-28

申请人： Randall S. Mundt

发明人： Randall S. Mundt

IPC分类号： B24B49/00

CPC分类号： B24B37/005 ,  B24B37/04 ,  B24B49/16

摘要： Some problems related to processing workpieces are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting data representing one or more process conditions used for processing a workpiece. Another embodiment of the present invention is a combination comprising a sensor apparatus and a process tool for applications such as chemical mechanical planarization of workpieces and chemical mechanical polishing of workpieces.

摘要翻译： 与处理工件有关的一些问题与一个或多个问题的解决方案一起呈现。 本发明的一个实施例包括用于收集表示用于处理工件的一个或多个工艺条件的数据的传感器装置。 本发明的另一实施例是一种组合，其包括传感器装置和用于诸如工件的化学机械平面化和工件的化学机械抛光等应用的工艺工具。

公开(公告)号：US07127362B2

公开(公告)日：2006-10-24

申请号：US10775044

申请日：2004-02-09

申请人： Randall S. Mundt

发明人： Randall S. Mundt

IPC分类号： G01L7/00

CPC分类号： G05B19/41865 ,  G05B17/02 ,  G05B2219/32019 ,  G05B2219/45031 ,  Y02P90/20

摘要： Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a process tolerant sensor apparatus capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods.

摘要翻译： 收集数据以得出响应模型和开发和维护过程和过程工具所需的信息。 用于收集数据的方法和装置包括能够采用标准方法通常可能采集的扰动少且中断少的采集数据的过程容忍传感器装置。

公开(公告)号：US5702533A

公开(公告)日：1997-12-30

申请号：US672317

申请日：1996-06-28

申请人： Randall S. Mundt ,  Kenneth R. Krieg

发明人： Randall S. Mundt ,  Kenneth R. Krieg

IPC分类号： C23C14/56 ,  H01L21/677 ,  C23C16/00

CPC分类号： C23C14/564 ,  H01L21/67709 ,  Y10S414/135

摘要： A pinch seal in which particle generation by frictional contact is prevented so that the pinch seal can be used in a semiconductor processing apparatus where elimination of particulate contamination is desirable. The pinch seal is particularly adapted for use in connection with a semiconductor wafer transport device, such as a linear transport device. The pinch seal is formed in a barrier provided between a transport device and a semiconductor processing work environment. One or more support members for transporting a wafer extend through the pinch seal. In one embodiment, the pinch seal includes a flexible sealing member with a magnetic strip extending along the length of the flexible sealing member. A mechanism which does not physically contact the flexible sealing member, such as a device generating a magnetic field, is used to selectively open and close the flexible sealing member to prevent contact between the flexible sealing member and the support member passing through the flexible sealing member while retaining the isolating function of the shielding member.

摘要翻译： 一种夹紧密封件，其中防止了通过摩擦接触产生颗粒，使得夹紧密封件可用于需要消除颗粒污染的半导体加工设备中。 夹紧密封件特别适合于与半导体晶片输送装置（例如线性输送装置）结合使用。 夹紧密封件形成在设置在传送装置和半导体处理工作环境之间的屏障中。 用于运输晶片的一个或多个支撑构件延伸穿过夹紧密封件。 在一个实施例中，夹紧密封件包括具有沿着柔性密封构件的长度延伸的磁条的柔性密封构件。 使用不与柔性密封构件（例如产生磁场的装置）物理接触的机构来选择性地打开和关闭柔性密封构件，以防止柔性密封构件与穿过柔性密封构件的支撑构件之间的接触 同时保持屏蔽构件的隔离功能。

公开(公告)号：US5654796A

公开(公告)日：1997-08-05

申请号：US577513

申请日：1995-12-22

申请人： Randall S. Mundt

发明人： Randall S. Mundt

IPC分类号： G01N21/73 ,  G01N21/62

CPC分类号： G01N21/73

摘要： An apparatus and method for mapping characteristics of a volume of plasma in a plasma reaction chamber uses a photosensitive detector, a scanner that scans the volume, and a light directing element that directs light emissions from the volume scanned by the scanner to the photosensitive detector. The photosensitive detector generates a signal corresponding to a detected amount of the light emissions from the volume and the signal is processed to estimate one or more characteristics of the volume.

摘要翻译： 用于映射等离子体反应室中的等离子体体积的特性的装置和方法使用光敏检测器，扫描该体积的扫描器和将来自扫描仪扫描的体积的光发射引导到光敏检测器的光引导元件。 光敏检测器产生对应于来自音量的检测到的光发射量的信号，并且处理信号以估计体积的一个或多个特性。

公开(公告)号：US07531984B2

公开(公告)日：2009-05-12

申请号：US11366303

申请日：2006-03-01

申请人： Mason L. Freed ,  Randall S. Mundt ,  Costas J. Spanos

发明人： Mason L. Freed ,  Randall S. Mundt ,  Costas J. Spanos

IPC分类号： H01M10/46

CPC分类号： H02J7/025 ,  H02J50/12

摘要： Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.

摘要翻译： 提出了用于管理和维护诸如传感器装置的电子设备的方法，系统和装置。

公开(公告)号：US07482576B2

公开(公告)日：2009-01-27

申请号：US11430315

申请日：2006-05-03

申请人： Randall S. Mundt ,  Andrew Beers ,  Paul D. MacDonald ,  Mason L. Freed ,  Dean Hunt

发明人： Randall S. Mundt ,  Andrew Beers ,  Paul D. MacDonald ,  Mason L. Freed ,  Dean Hunt

IPC分类号： G01J5/00

CPC分类号： G01J1/4228 ,  G01J1/02 ,  G01J1/0204

摘要： One or more problems related to processing workpieces using processes that involve optical radiation are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting optical radiation data representing one or more process conditions used for processing a workpiece. In a further embodiment, the sensor apparatus is also configured for measuring data other than optical radiation.

摘要翻译： 与使用涉及光辐射的过程处理工件相关的一个或多个问题与解决方案一起呈现给一个或多个问题。 本发明的一个实施例包括用于收集表示用于处理工件的一个或多个工艺条件的光辐射数据的传感器装置。 在另一实施例中，传感器装置还被配置用于测量光辐射以外的数据。

公开(公告)号：US06719456B2

公开(公告)日：2004-04-13

申请号：US10045676

申请日：2001-10-23

申请人： Randall S. Mundt ,  James C. Mundt

发明人： Randall S. Mundt ,  James C. Mundt

IPC分类号： G01N2500

CPC分类号： G08B17/06

摘要： A method of detecting fire ignition sources includes using an electronic temperature sensor to probe potential ignition sites. The fire hazards for the sites are determined based on at least one of measurements of temperatures at or near the site, measurements of rate of temperature rise at or near the site, and measurements of temperature gradients at or near the site. Apparatus for performing the method is also described.

摘要翻译： 检测火灾点火源的方法包括使用电子温度传感器探测潜在的点火位置。 场地的火灾危险性是根据站点处或附近的温度测量中的至少一个来测定的，站点处或附近的温度上升速率以及站点处或附近温度梯度的测量。 还描述了用于执行该方法的装置。

公开(公告)号：US5714031A

公开(公告)日：1998-02-03

申请号：US486573

申请日：1995-06-07

申请人： Randall S. Mundt ,  David R. Kerr ,  Eric Howard Lenz

发明人： Randall S. Mundt ,  David R. Kerr ,  Eric Howard Lenz

IPC分类号： C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  B08B7/00 ,  C23F1/02

CPC分类号： H01J37/32009 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32596

摘要： A plasma discharge electrode having a front surface with a central portion thereof including outlets for discharging reactant gas which forms a plasma and a peripheral portion substantially surrounding the outlets. The peripheral portion has at least one recess for locally enhancing a density of the plasma formed by the electrode. The recess can be formed in a replaceable insert and the electrode can be made from a single crystal of silicon.

公开(公告)号：US5472565A

公开(公告)日：1995-12-05

申请号：US153084

申请日：1993-11-17

申请人： Randall S. Mundt ,  David R. Kerr ,  Eric H. Lenz

发明人： Randall S. Mundt ,  David R. Kerr ,  Eric H. Lenz

IPC分类号： C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  B08B7/00 ,  C23F1/02

CPC分类号： H01J37/32009 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32596

摘要： A plasma discharge electrode having a front surface with a central portion thereof including outlets for discharging reactant gas which forms a plasma and a peripheral portion substantially surrounding the outlets. The peripheral portion has at least one recess for locally enhancing a density of the plasma formed by the electrode. The recess can be formed in a replaceable insert and the electrode can be made from a single crystal of silicon.

摘要翻译： 一种具有前表面的等离子体放电电极，其中心部分包​​括用于排出形成等离子体的反应气体的出口和基本上围绕出口的周边部分。 周边部分具有用于局部增强由电极形成的等离子体的密度的至少一个凹部。 凹槽可以形成在可替换的插入件中，并且电极可以由单晶硅制成。