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公开(公告)号:US20130341728A1
公开(公告)日:2013-12-26
申请号:US14011704
申请日:2013-08-27
Applicant: Renesas Electronics Corporation
Inventor: Takahiro HAYASHI , Shunsuke TOYOSHIMA , Kazuo SAKAMOTO , Naozumi MORINO , Kazuo TANAKA
IPC: H01L23/498
CPC classification number: H01L23/49844 , H01L23/49811 , H01L23/50 , H01L23/5226 , H01L23/5286 , H01L23/53228 , H01L23/585 , H01L24/05 , H01L24/06 , H01L24/49 , H01L27/0255 , H01L27/092 , H01L2224/02166 , H01L2224/05025 , H01L2224/05093 , H01L2224/05095 , H01L2224/05124 , H01L2224/05624 , H01L2224/06102 , H01L2224/06133 , H01L2224/06143 , H01L2224/06153 , H01L2224/06163 , H01L2224/49105 , H01L2224/85399 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/01029 , H01L2924/01033 , H01L2924/01074 , H01L2924/01082 , H01L2924/12036 , H01L2924/1306 , H01L2924/14 , H01L2924/00 , H01L2224/05599 , H01L2224/45015 , H01L2924/207 , H01L2224/45099
Abstract: The present invention has for its purpose to provide a technique capable of reducing planar dimension of the semiconductor device. An input/output circuit is formed over the semiconductor substrate, a grounding wiring and a power supply wiring pass over the input/output circuit, and a conductive layer for a bonding pad is formed thereover. The input/output circuit is formed of MISFET elements in the nMISFET forming region and the pMISFET forming region, resistance elements in the resistance element forming regions and diode elements in the diode element forming regions functioning as protective elements. A wiring connected to the protective elements and positioned under the grounding wiring and the power supply wiring is pulled out in a pulling-out region between the nMISFET forming region and the pMISFET forming region and between the grounding wiring and the power supply wiring to be connected to the conductive layer.
Abstract translation: 本发明的目的是提供一种能够减小半导体器件的平面尺寸的技术。 在半导体衬底上形成输入/输出电路,接地布线和电源布线通过输入/输出电路,并且在其上形成用于焊盘的导电层。 输入/输出电路由nMISFET形成区域和pMISFET形成区域中的MISFET元件形成,电阻元件形成区域中的电阻元件和用作保护元件的二极管元件形成区域中的二极管元件。 连接到保护元件并位于接地布线和电源布线下方的布线在nMISFET形成区域和pMISFET形成区域之间以及接地布线和要连接的电源布线之间的拉出区域中拉出 到导电层。