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公开(公告)号：US08395755B2
公开(公告)日：2013-03-12
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US20090284720A1
公开(公告)日：2009-11-19
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC分类号： G03B27/68
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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3.发明授权Lithographic apparatus, programmable patterning device and lithographic method 有权光刻设备，可编程图案形成装置和光刻方法公开(公告)号：US08531648B2
公开(公告)日：2013-09-10
申请号：US13119884
申请日：2009-09-21
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。
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公开(公告)号：US07190434B2
公开(公告)日：2007-03-13
申请号：US10779823
申请日：2004-02-18
IPC分类号： G03B27/42
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。
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公开(公告)号：US08390787B2
公开(公告)日：2013-03-05
申请号：US11733327
申请日：2007-04-10
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，包括用于将光束横截面赋予图案的独立可控元件阵列的图案化装置，用于支撑衬底的衬底台以及包含微透镜的投影系统 阵列，用于将光束投影到基板的目标部分上。 提供误差补偿器，用于提供用于补偿微透镜阵列中的位置误差的影响的误差校正值，并且提供灰度调制器，用于根据纠错值按顺序将驱动信号提供给图案化装置的可控元件 以通过相对于图案的其它部分改变图案的一些部分的强度来补偿微透镜阵列中位置误差的影响。
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公开(公告)号：US20090213353A1
公开(公告)日：2009-08-27
申请号：US12412437
申请日：2009-03-27
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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公开(公告)号：US07426076B2
公开(公告)日：2008-09-16
申请号：US11019672
申请日：2004-12-23
CPC分类号： G03F7/70275 , G02B17/002 , G02B17/008 , G02B17/0812 , G03F7/70233
摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
摘要翻译： 一种用于具有多个镜像成像系统的光刻设备的投影系统。 在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。 每个镜像成像系统都具有相关的成像领域。 镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。 每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。 凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。 在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。
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公开(公告)号：US07609362B2
公开(公告)日：2009-10-27
申请号：US10983336
申请日：2004-11-08
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Jacob Fredrik Friso Klinkhamer , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Jacob Fredrik Friso Klinkhamer , Eduard Hoeberichts
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译： 一种用于曝光衬底的光刻设备和方法。 照明系统提供一系列由单独可控元件的阵列构图的辐射束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。 投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。 轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。 朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分 轨道暴露于基本上相同的最大强度的辐射。 相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。
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公开(公告)号：US07428040B2
公开(公告)日：2008-09-23
申请号：US11717174
申请日：2007-03-13
IPC分类号： G03B27/54
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于图形化的辐射束，随后将其投射到基板上。
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公开(公告)号：US07202939B2
公开(公告)日：2007-04-10
申请号：US11018927
申请日：2004-12-22
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，包括用于将光束横截面赋予图案的独立可控元件阵列的图案化装置，用于支撑衬底的衬底台以及包含微透镜的投影系统 阵列，用于将光束投影到基板的目标部分上。 提供误差补偿器，用于提供用于补偿微透镜阵列中的位置误差的影响的误差校正值，并且提供灰度调制器，用于根据纠错值按顺序将驱动信号提供给图案化装置的可控元件 以通过相对于图案的其它部分改变图案的一些部分的强度来补偿微透镜阵列中位置误差的影响。
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