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公开(公告)号：US20090284720A1
公开(公告)日：2009-11-19
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC分类号： G03B27/68
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US08395755B2
公开(公告)日：2013-03-12
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US20080218718A1
公开(公告)日：2008-09-11
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC分类号： G03B27/42
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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公开(公告)号：US07576834B2
公开(公告)日：2009-08-18
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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公开(公告)号：US07385675B2
公开(公告)日：2008-06-10
申请号：US10853577
申请日：2004-05-26
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoom
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoom
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
摘要翻译： 在基板曝光期间检查基板上的对准标记以优化曝光条件的光刻设备。
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公开(公告)号：US07046331B2
公开(公告)日：2006-05-16
申请号：US10407944
申请日：2003-04-07
CPC分类号： G03F7/70633 , G03F7/70733 , Y10T428/24802 , Y10T428/24835
摘要： A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.
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7.发明授权Arrangement for producing free atoms of a substance for atomic spectroscopy purposes 失效用于产生原子光谱学目的的物质的自由原子的布置
公开(公告)号：US4009963A
公开(公告)日：1977-03-01
申请号：US559824
申请日：1975-03-19
CPC分类号： G01N21/74
摘要： An arrangement is discussed for producing free atoms of a substance for atomic spectroscopy purposes comprising an oven and an oven element, which contains the substance to be examined, which oven is surrounded by cooling means which, during the spectroscopic measurements, cool the oven wall and which must have a temperature of at least 30.degree. C.
摘要翻译： 讨论了用于产生用于原子光谱学目的的用于原子光谱学目的的物质的自由原子的布置，其包括烘箱和烘箱元件，其包含待检查物质，该烘箱被冷却装置包围，在光谱测量期间，将炉壁冷却， 其必须具有至少30℃的温度
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公开(公告)号：US3981200A
公开(公告)日：1976-09-21
申请号：US609012
申请日：1975-08-29
CPC分类号： G01N35/1079 , G01N21/74
摘要： A method of transferring and injecting a liquid sample, by supplying an inert gas to an injection needle after normal injection has taken place by the action of a plunger. The injection syringe is constructed to allow the inert gas to pass freely even when the needle is fully depressed, to remove any drop clinging to the tip or needle inner wall.
摘要翻译： 通过柱塞的作用发生正常注射之后，通过向注射针供给惰性气体来转移和注入液体样品的方法。 注射注射器被构造成允许惰性气体即使当针被完全压下时也可自由通过，以去除粘附到尖端或针内壁的任何液滴。
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公开(公告)号：US3979162A
公开(公告)日：1976-09-07
申请号：US377796
申请日：1973-07-09
CPC分类号： F27B17/02 , G01N21/74 , H05B3/0014 , H05H3/02
摘要： A furnace for heating a sample of a substance to produce free atoms for atomic spectroscopy wherein an unequal temperature distribution is created in a sample holding element and a protective gas flows through the sample holding element in the direction of increasing temperature to reduce the tendency of free atoms to condense on surfaces of the sample holding element.
摘要翻译： 一种用于加热物质样品以产生原子光谱的自由原子的炉，其中在样品保持元件中产生不相等的温度分布并且保护气体沿着温度升高的方向流过样品保持元件以减少游离的倾向 原子在样品保持元件的表面上冷凝。
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