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公开(公告)号:US20080006529A1
公开(公告)日:2008-01-10
申请号:US11851779
申请日:2007-09-07
申请人: Richard Seddon , Russell Barbaria , Ralf Erz , Markus Tilsch
发明人: Richard Seddon , Russell Barbaria , Ralf Erz , Markus Tilsch
IPC分类号: C23C14/00
CPC分类号: C23C14/50 , H01L21/68721 , H01L21/68728 , H01L21/68764 , Y10T29/49895 , Y10T29/49998 , Y10T29/53957
摘要: A device for mounting and removing a substrate from a baseplate, in particular a substrate holder assembly device, including automated features for latching and unlatching a substrate, for use in a coating mechanism, from a baseplate, which includes an adjustable snap ring holder.
摘要翻译: 一种用于从基板,特别是基板保持器组件装置安装和移除基板的装置,包括用于从包括可调节卡环的基板在用于涂覆机构中的用于锁定和解锁基板的自动特征。
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公开(公告)号:US20060070877A1
公开(公告)日:2006-04-06
申请号:US11205398
申请日:2005-08-17
申请人: Markus Tilsch , Richard Seddon , Georg Ockenfuss , Jeremy Hayes , Robert Klinger
发明人: Markus Tilsch , Richard Seddon , Georg Ockenfuss , Jeremy Hayes , Robert Klinger
CPC分类号: H01J37/34 , H01J37/32541 , H01J37/3438
摘要: The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.
摘要翻译: 磁控溅射装置及其制造方法技术领域本发明涉及一种磁控溅射装置及其制造方法,其特征在于,以高生产率将基板上的材料沉积在基板上,其中沉积膜具有预测的厚度分布,并且该装置能够连续且重复地操作非常长的 本发明通过减少循环时间实现了增加的生产。 通过将行星驱动系统与大阴极联接来实现涂层速率的提高。 阴极直径大于行星的直径,小于行星直径的两倍。 通过阴极处的较低的功率密度获得较低的缺陷率,其抑制电弧,同时径流通过阴极至行星几何形状而被最小化,而不使用掩模。
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公开(公告)号:US20060049041A1
公开(公告)日:2006-03-09
申请号:US11074249
申请日:2005-03-07
申请人: Georg Ockenfuss , Markus Tilsch , Richard Seddon , Robert Hahn
发明人: Georg Ockenfuss , Markus Tilsch , Richard Seddon , Robert Hahn
IPC分类号: C23C14/00
CPC分类号: H01J37/3405 , H01J37/3438
摘要: A sputtering anode is disclosed wherein the anode is in the form of a container or vessel; and, wherein the conducting surface communicating with a cathode is the inside surface of the container or vessel. The anode can be mounted outside of a coating chamber having its opening communicating with the chamber or alternatively may be mounted within the chamber. The anode may be an inlet port for receiving inert gas for use in forming the plasma and for pressurizing the anode.
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公开(公告)号:US20060081468A1
公开(公告)日:2006-04-20
申请号:US10968642
申请日:2004-10-19
申请人: Richard Seddon , Markus Tilsch , Jeremy Hayes
发明人: Richard Seddon , Markus Tilsch , Jeremy Hayes
CPC分类号: C23C14/505 , C23C16/4584 , C23C16/4586 , H01J37/32715 , H01J37/34 , H01J37/3417 , H01L21/68764 , H01L21/68771 , H01L21/68785 , H01L21/68792
摘要: The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.
摘要翻译: 本发明涉及一种用于将基板固定在悬浮在气相沉积系统的真空室中的涂覆源上方的行星旋转平台上的磁性闩锁, 化学气相沉积(CVD)系统或物理气相沉积(PVD)系统。 磁性闩锁包括永久磁铁,该永久磁铁可以在其中永磁体磁化闩锁以吸引衬底保持器的闩锁位置和永久磁铁连接在旁路电路中的解锁位置之间移动,从而使 用于释放衬底保持器的闩锁。
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公开(公告)号:US20060049042A1
公开(公告)日:2006-03-09
申请号:US11177465
申请日:2005-07-08
申请人: Markus Tilsch , Georg Ockenfuss , Richard Seddon , Robert Hahn
发明人: Markus Tilsch , Georg Ockenfuss , Richard Seddon , Robert Hahn
IPC分类号: C23C14/00
CPC分类号: H01J37/34 , H01J37/32541 , H01J37/3438
摘要: A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
摘要翻译: 公开了一种用于真空沉积工艺中的磁控溅射阴极,其中阴极通过电绝缘材料如氧化铝在其侧面上涂覆以防止电弧,并且其中阴极的第一端面支撑待溅射的材料。 阴极的底部也可以涂覆有电绝缘涂层,或者可以搁置在绝缘平台上。
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公开(公告)号:US06721100B2
公开(公告)日:2004-04-13
申请号:US10197865
申请日:2002-07-19
申请人: Markus Tilsch
发明人: Markus Tilsch
IPC分类号: G02B2700
CPC分类号: G02B5/281
摘要: Thin film filters have been a basic building block of many wavelength division multiplexed (WDM) systems providing the means by which a signal, defined by a center wavelength, can be separated from a group of WDM signals. In an effort to maintain the same performance over a range of operating temperatures, thin film filters have been coated onto specially designed substrates, which expand and contract with the change in temperature to counteract the effects that the temperature change has on the thin film filters. Unfortunately, only very few materials provide the necessary thermal expansion characteristics to counteract the shift in center wavelength. Moreover, the application of a force onto only one side of the filter causes the thin film filter to bend or curve. Accordingly, the present invention solves the aforementioned problems by providing a thin film filter sandwiched between a substrate and a superstrate, which apply equal forces to each side of the filter. The present invention also includes an actively tunable thin film filter assembly, which utilizes stress applying devices, e.g. heaters or piezo-electric crystals, to adjust signal characteristics, such as the bandwidth, the group delay, and the chromatic dispersion, as desired.
摘要翻译: 薄膜滤波器已经成为许多波分复用(WDM)系统的基本构建块,其提供了由中心波长定义的信号可以与一组WDM信号分离的装置。 为了在一定范围的工作温度下保持相同的性能,薄膜过滤器已被涂覆到特别设计的基板上,随着温度的变化而膨胀和收缩,以抵消温度变化对薄膜过滤器的影响。 不幸的是,只有很少的材料提供必要的热膨胀特性来抵消中心波长的偏移。 此外,仅将力施加到过滤器的一侧使得薄膜过滤器弯曲或弯曲。 因此,本发明通过提供夹在基板和覆层之间的薄膜过滤器来解决上述问题,其对过滤器的每一侧施加相等的力。 本发明还包括主动可调薄膜过滤器组件,其利用应力施加装置,例如, 加热器或压电晶体,根据需要调整诸如带宽,组延迟和色散的信号特性。
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