公开(公告)号：US6022672A

公开(公告)日：2000-02-08

申请号：US621332

申请日：1996-03-25

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  H01L21/677 ,  G03C5/00

CPC classification number: G03F7/7075 ,  G03F7/70866 ,  G03F7/70875 ,  H01L21/67161 ,  H01L21/67225 ,  G03F7/26

Abstract: A method, system or device for forming a resist pattern applied to fine processing, such as that for preparation of a semiconductor device. The wafer transportation system for the process affected by processing conditions of the process, such as the temperature or time, is provided independently of the wafer transportation system for other processes in order to prevent heat transmission through a transport arm to assure a more accurate resist forming operation and to control the wafer transportation time between the processes more accurately and promptly. Pattern formation may be achieved more accurately through the use of a chemical amplification resist material subject to influences from the wafer environment.

Abstract translation: 用于形成用于精细加工的抗蚀剂图案的方法，系统或装置，例如用于制备半导体器件的抗蚀剂图案。 用于处理过程影响的工艺的晶片输送系统，例如温度或时间，独立于用于其它工艺的晶片输送系统提供，以防止通过输送臂的热传递，以确保更准确的抗蚀剂形成 并且更准确和及时地控制晶片在工艺之间的运输时间。 通过使用受到晶片环境的影响的化学放大抗蚀剂材料，可以更精确地实现图案形成。

公开(公告)号：US5821035A

公开(公告)日：1998-10-13

申请号：US811261

申请日：1997-03-04

Applicant: Harunobu Hirano ,  Yasushi Kusano ,  Rikio Ikeda ,  Ritsuko Inoue

Inventor： Harunobu Hirano ,  Yasushi Kusano ,  Rikio Ikeda ,  Ritsuko Inoue

IPC: G03F7/30

CPC classification number: G03F7/3021

Abstract: A developing apparatus used for developing a resist applied on a substrate, comprises: developer storage means for storing a developer; a developer supply tube for supplying the developer from the developer storage means through one end thereof onto a substrate supported in a position; and degas means located immediately upstream of the one end of the developer supply tube to deaerate the developer. A resist developing method comprises the steps of: supplying a substance; applying a resist onto the substrate; making a latest image in the resist; and supplying a developer onto the resist having the latest image to develop the resist, wherein the step of supplying the developer provides the developer in several times. Another resist developing method comprises the steps of: supplying a substrate; applying a resist onto the substrate; forming a latest image in the resist; providing a developer onto the resist having the latest image therein; after providing the developer, rotating the substrate and then stopping same; maintaining the substrate still; and rotating the substrate and then stopping same.

Abstract translation: 一种显影装置，用于显影施加在基板上的抗蚀剂，包括：显影剂存储装置，用于存储显影剂; 显影剂供应管，其用于将显影剂从显影剂存储装置的一端供应到支撑在一个位置的基底上; 以及位于显影剂供应管的一端紧邻上游的脱气装置，以使显影剂脱气。 抗蚀剂显影方法包括以下步骤：提供物质; 将抗蚀剂涂布在基材上; 在抗拒中形成最新形象; 并且将显影剂供应到具有最新图像的抗蚀剂上以开发抗蚀剂，其中提供显影剂的步骤为显影剂提供多次。 另一种抗蚀剂显影方法包括以下步骤：提供衬底; 将抗蚀剂涂布在基材上; 在抗蚀剂中形成最新的图像; 在其中具有最新图像的抗蚀剂上提供显影剂; 在提供显影剂之后，旋转基底然后停止; 保持底物; 并旋转基板，然后停止。

公开(公告)号：US5342738A

公开(公告)日：1994-08-30

申请号：US894295

申请日：1992-06-04

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: G03F7/30 ,  G03C5/00

CPC classification number: G03F7/3021

Abstract: Disclosed is herein a method of developing an exposed resist film formed over a major surface of a substrate, the method comprising: holding the substrate carrying the resist film in contact with the supporting surface of a supporting member, having an area smaller than the surface area of the substrate, and supplying a developer onto the resist film so that the developer is retained in a developer puddle by surface tension on the surface of the resist film to develop the resist film, wherein the substrate carrying the resist film is separated from the supporting member during the progress of the development of the resist film.

Abstract translation: 本文公开了一种在衬底的主表面上形成的曝光的抗蚀剂膜的方法，该方法包括：将承载抗蚀剂膜的衬底保持在与支撑构件的支撑表面接触的位置，该支撑表面的面积小于表面积 并且将显影剂供应到抗蚀剂膜上，使得显影剂通过抗蚀剂膜表面上的表面张力保持在显影剂池中，以形成抗蚀剂膜，其中携带抗蚀剂膜的基板与支撑体分离 抗蚀膜发展进程中的成员。

公开(公告)号：US5395649A

公开(公告)日：1995-03-07

申请号：US13023

申请日：1993-02-03

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: B05D1/00 ,  G03F7/16 ,  H01L21/00 ,  B05D3/12

CPC classification number: H01L21/6715 ,  B05D1/005 ,  G03F7/162

Abstract: A method and apparatus for rotating a substrate having a liquid material placed thereon to coat the liquid material over the substrate. A plate member is positioned at a predetermined height above the substrate to minimize the growth of the fluid flows produced above the substrate due to rotation of the substrate.

Abstract translation: 一种旋转具有放置在其上的液体材料的基底的方法和装置，以将液体材料涂覆在基底上。 板构件定位在衬底上方的预定高度处，以使得由于衬底的旋转而在衬底上产生的流体流的生长最小化。

公开(公告)号：US5378963A

公开(公告)日：1995-01-03

申请号：US188736

申请日：1994-01-31

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: H01J3/02 ,  H01J29/08 ,  H01J31/12 ,  H01J1/02 ,  H01J19/10 ,  H01J43/00

CPC classification number: H01J29/482 ,  H01J29/085 ,  H01J3/022 ,  H01J31/127

Abstract: A flat display apparatus has a substrate, a plurality of pointed cathodes formed on the substrate, a planar anode facing toward the cathodes via a vacuum space, and a light emitting layer on the side of the anode which is opposite from the cathodes. The anode has a plurality of projections in positions corresponding to the cathodes. The anode projections reduce electron scatter to improve light emission from the light emitting layer. In another embodiment of the flat display apparatus, a plurality of electron sources are disposed on the substrate and positioned relative to one another in an alternately staggered vertical positional sequence toward a light emitting member so that electrons are successively amplified. In a further embodiment of the flat display apparatus, wherein a plurality of electron sources are disposed on the substrate, an electrode faces toward the electron sources, and a light emitting member is provided on a side of the electrode opposite and facing away from the substrate, the electron sources include a primary electron source for generating primary electrons and a secondary electron source for amplifying primary electrons from the primary electron source due to a malta effect.

Abstract translation: 平面显示装置具有基板，形成在基板上的多个尖锐阴极，经由真空空间朝向阴极的平面阳极以及与阴极相对的阳极侧的发光层。 阳极在对应于阴极的位置具有多个突起。 阳极突起减少电子散射以改善发光层的发光。 在平面显示装置的另一个实施例中，多个电子源设置在基板上并且相对于彼此以交替错开的垂直位置顺序朝向发光部件定位，使得电子被连续放大。 在平面显示装置的另一实施例中，其中多个电子源设置在基板上，电极面向电子源，并且发光部件设置在电极的与基板相对的背面侧 电子源包括用于产生一次电子的初级电子源和用于由于麦芽作用而放大一次电子源的一次电子的二次电子源。

公开(公告)号：US5840445A

公开(公告)日：1998-11-24

申请号：US873150

申请日：1992-04-24

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: G03F1/29 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027 ,  G03F9/00

CPC classification number: G03F7/2022 ,  G03F1/29

Abstract: A phase-shifting mask having a light shielding portion, a light permeation portion and a phase-shifting portion on a transparent substrate is manufactured by forming a negative resist layer to the entire surface on a transparent substrate formed with a light shielding material pattern, applying exposure from the rearface of the transparent substrate, followed by applying development to leave the negative resist layer on the light permeation portion, then further continuing development for the negative resist layer to reduce the width and form a sub-space between the negative resist layer and the light shielding portion, to obtain a phase-shifting portion easily and at a high accuracy. The phase-shifting portion can be formed by an easy and simple step under a good controllability free from of the problems of mask alignment between each other.

Abstract translation: 通过在形成有遮光材料图案的透明基板上的整个表面上形成负的抗蚀剂层来制造在透明基板上具有遮光部分，透光部分和相移部分的相移掩模， 从透明基板的背面曝光，然后进行显影以在光透射部分上留下负的抗蚀剂层，然后进一步持续显影负极抗蚀剂层以减小宽度并形成负的抗蚀剂层和 光屏蔽部分，以容易且高精度地获得相移部分。 相位移部分可以通过简单且简单的步骤形成，而不受掩模对准的问题。

公开(公告)号：US5473219A

公开(公告)日：1995-12-05

申请号：US320253

申请日：1994-10-11

Applicant: Rikio Ikeda

Inventor： Rikio Ikeda

IPC: H01J3/02 ,  H01J29/08 ,  H01J31/12 ,  H01J43/00

CPC classification number: H01J29/482 ,  H01J29/085 ,  H01J3/022 ,  H01J31/127

Abstract: A flat display apparatus has a substrate, a plurality of pointed cathodes formed on the substrate, a planar anode facing toward the cathodes via a vacuum space, and a light emitting layer on the side of the anode which is opposite from the cathodes. The anode has a plurality of projections in positions corresponding to the cathodes. The anode projections reduce electron scatter to improve light emission from the light emitting layer. In another embodiment of the flat display apparatus, a primary electron source and a plurality of secondary electron sources connected to bias voltages are disposed on the substrate and positioned relative to one another in an alternately staggered vertical positional sequence toward a light emitting member so that electrons are successively amplified. In a further embodiment of the flat display apparatus, wherein a plurality of electron sources are disposed on the substrate, an electrode faces toward the electron sources, and a light emitting member is provided on a side of the electrode opposite and facing away from the substrate, the electron sources include a primary electron source for generating primary electrons and a secondary electron source for amplifying primary electrons from the primary electron source due to a Malta effect.

Abstract translation: 平面显示装置具有基板，形成在基板上的多个尖锐阴极，经由真空空间朝向阴极的平面阳极以及与阴极相对的阳极侧的发光层。 阳极在对应于阴极的位置具有多个突起。 阳极突起减少电子散射以改善发光层的发光。 在平面显示装置的另一实施例中，连接到偏置电压的初级电子源和多个二次电子源被布置在衬底上并且相对于彼此以交替错开的垂直位置顺序朝向发光部件定位，使得电子 被连续放大。 在平面显示装置的另一实施例中，其中多个电子源设置在基板上，电极面向电子源，并且发光部件设置在电极的与基板相对的背面侧 电子源包括用于产生一次电子的一次电子源和用于由于马耳他效应而从一次电子源放大一次电子的二次电子源。