公开(公告)号：US20140120470A1

公开(公告)日：2014-05-01

申请号：US13665232

申请日：2012-10-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Gerhard POHLERS ,  Cong LIU ,  Cheng-Bai XU ,  Chunyi WU

IPC: G03F7/038 ,  G03F7/20

Abstract: New photoresist compositions are provided that comprise a component that comprises a radiation-insensitive ionic compound. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.

Abstract translation: 提供了新的光致抗蚀剂组合物，其包含包含辐射不敏感的离子化合物的组分。 本发明优选的光致抗蚀剂可以包含具有光酸不稳定基团的树脂; 光致酸发生剂化合物; 以及辐射不敏感的离子化合物，其可以起到减少光致抗蚀剂涂层的未曝光区域中不期望的光生酸扩散的作用。

公开(公告)号：US20140295348A1

公开(公告)日：2014-10-02

申请号：US14301177

申请日：2014-06-10

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Deyan WANG ,  Chunyi WU

IPC: G03F7/11

CPC classification number: G03F7/11 ,  C08F220/38 ,  C08F220/56 ,  C08L33/16 ,  C08L2205/025 ,  C08L2205/03 ,  G03F7/0046 ,  G03F7/2041 ,  H01L21/0274

Abstract: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.

Abstract translation: 提供了在光致抗蚀剂组合物上施加的面漆层组合物。 该组合物特别适用于浸渍光刻加工。

公开(公告)号：US20140120469A1

公开(公告)日：2014-05-01

申请号：US13665104

申请日：2012-10-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Gregory P. PROKOPOWICZ ,  Gerhard POHLERS ,  Cong LIU ,  Chunyi WU ,  Cheng-Bai XU

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/40

Abstract: New photoresist compositions are provided that comprise a component that comprises a thermal acid generator and a quencher. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and at least one thermal acid generator and at least one quencher that can function to improve line width roughness and photospeed.

Abstract translation: 提供了新的光致抗蚀剂组合物，其包含包含热酸发生剂和猝灭剂的组分。 本发明优选的光致抗蚀剂可以包含具有光酸不稳定基团的树脂; 光致酸发生剂化合物; 和至少一个热酸发生器和至少一个能够改善线宽粗糙度和光速的功能的猝灭剂。

公开(公告)号：US20130344439A1

公开(公告)日：2013-12-26

申请号：US13926764

申请日：2013-06-25

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Cong LIU ,  Chunyi WU ,  Gerhard POHLERS ,  Gregory P. PROKOPOWICZ ,  Mingqi LI ,  Cheng-Bai XU

IPC: G03F7/004

Abstract: New photoresist compositions are provided that comprise a component that comprises an amide group and multiple hydroxyl groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and an amide component with multiple hydroxyl groups that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer

Abstract translation: 提供了新的光致抗蚀剂组合物，其包含包含酰胺基和多个羟基的组分。 本发明优选的光致抗蚀剂可以包含具有光酸不稳定基团的树脂; 光致酸发生剂化合物; 和具有多个羟基的酰胺组分，其可以起到减少光致抗蚀剂涂层的未曝光区域中不期望的光生酸扩散的作用