公开(公告)号：US11674065B2

公开(公告)日：2023-06-13

申请号：US16537264

申请日：2019-08-09

申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.

发明人： Stephen Bottiglieri ,  James A. Salvatore ,  Ian T. Sines

IPC分类号： C01F7/02 ,  C09K3/14 ,  C09G1/02 ,  C04B35/64 ,  C01F7/441

CPC分类号： C09K3/1409 ,  C01F7/02 ,  C09G1/02 ,  C09K3/1454 ,  C01F7/441 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/16 ,  C01P2006/80 ,  C04B35/64

摘要： A composition having a plurality of abrasive particles including alumina, the plurality of abrasive particles have mesoporosity with an average meso branching index of at least 55 junctions/microns2 and a median particle size (D50) of at least 5 microns.

公开(公告)号：US10982114B2

公开(公告)日：2021-04-20

申请号：US16165640

申请日：2018-10-19

申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.

发明人： Ian T. Sines ,  Stephen Bottiglieri ,  Douglas E. Ward ,  Nabil Nahas ,  Mark Hampden-Smith ,  Steven L. Robare

IPC分类号： C09G1/02 ,  C09G1/00 ,  C09G1/04 ,  C09K3/14

摘要： A composition including a carrier comprising a liquid, an abrasive particulate contained in the carrier, an accelerant contained in the carrier, the accelerant including at least one free anion selected from the group of iodide (I−), bromide (Br−), fluoride (F−), sulfate (SO42−), sulfide (S2−), sulfite (SO32−), chloride (Cl−), silicate (SiO44−), phosphate (PO43−), nitrate (NO3−), carbonate (CO32−), perchlorate (ClO4−), or any combination thereof, and a buffer contained in a saturated concentration in the carrier, the buffer including a compound selected from MaFx, NbFx, MaNbFx, MaIx, NbIx, MaNbIx, MaBrx, NbBrx, MaNbBrx, Ma(SO4)x, Nb(SO4)x, MaNb(SO4)x, MaSx, NbSx, MaNbSx, Ma(SiO4)x, Nb(SiO4)x, MaNb(SiO4)x, Ma(PO4)x, Nb(PO4)x, MaNb(PO4)x, Ma(NO3)x, Nb(NO3)x, MaNb(NO3)x, Ma(CO3)x, Nb(CO3)x, MaNb(CO3)x, or any combination, wherein M represents a metal element or metal compound; N represents a non-metal element; and a, b, and x is 1-6.

公开(公告)号：US10329455B2

公开(公告)日：2019-06-25

申请号：US15710897

申请日：2017-09-21

申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.

发明人： Ian T. Sines ,  Angela Kwapong ,  Carlijn L. Mulder ,  Douglas E. Ward ,  Vianney Le Roux

IPC分类号： C09G1/04 ,  C09K3/14 ,  H01L21/306 ,  C09G1/02

摘要： A CMP slurry including a carrier, a particulate material within the carrier including an oxide, carbide, nitride, boride, diamond or any combination thereof, an oxidizer including at least one material selected from the group of peroxides, persulfates, permanganates, periodates, perchlorates, hypocholorites, iodates, peroxymonosulfates, cerric ammonium nitrate, periodic acid, ferricyanides, or any combination thereof, and a material removal rate index (MRR) of at least 500 nm/hr and an average roughness index (Ra) of not greater than 5 Angstroms according to the Standardized Polishing test.

公开(公告)号：US20190119525A1

公开(公告)日：2019-04-25

申请号：US16165640

申请日：2018-10-19

申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.

发明人： Ian T. Sines ,  Stephen Bottiglieri ,  Douglas E. Ward ,  Nabil Nahas ,  Mark Hampden-Smith ,  Steven L. Robare

IPC分类号： C09G1/02

摘要： A composition including a carrier comprising a liquid, an abrasive particulate contained in the carrier, an accelerant contained in the carrier, the accelerant including at least one free anion selected from the group of iodide (I−), bromide (Br−), fluoride (F−), sulfate (SO42−), sulfide (S2−), sulfite (SO32−), chloride (Cl−), silicate (SiO44−), phosphate (PO43−), nitrate (NO3−), carbonate (CO32−), perchlorate (ClO4−), or any combination thereof, and a buffer contained in a saturated concentration in the carrier, the buffer including a compound selected from MaFx, NbFx, MaNbFx, MaIx, NbIx, MaNbIx, MaBrx, NbBrx, MaNbBrx, Ma(SO4)x, Nb(SO4)x, MaNb(SO4)x, MaSx, NbSx, MaNbSx, Ma(SiO4)x, Nb(SiO4)x, MaNb(SiO4)x, Ma(PO4)x, Nb(PO4)x, MaNb(PO4)x, Ma(NO3)x, Nb(NO3)x, MaNb(NO3)x, Ma(CO3)x, Nb(CO3)x, MaNb(CO3)x, or any combination, wherein M represents a metal element or metal compound; N represents a non-metal element; and a, b, and x is 1-6.

公开(公告)号：US20180086944A1

公开(公告)日：2018-03-29

申请号：US15710897

申请日：2017-09-21

申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.

发明人： Ian T. Sines ,  Angela Kwapong ,  Carlijn L. Mulder ,  Douglas E. Ward ,  Vianney Le Roux

IPC分类号： C09G1/04 ,  C09K3/14 ,  H01L21/306

CPC分类号： C09G1/04 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/02024 ,  H01L21/30625

摘要： A CMP slurry including a carrier, a particulate material within the carrier including an oxide, carbide, nitride, boride, diamond or any combination thereof, an oxidizer including at least one material selected from the group of peroxides, persulfates, permanganates, periodates, perchlorates, hypocholorites, iodates, peroxymonosulfates, cerric ammonium nitrate, periodic acid, ferricyanides, or any combination thereof, and a material removal rate index (MRR) of at least 500 nm/hr and an average roughness index (Ra) of not greater than 5 Angstroms according to the Standardized Polishing test.