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公开(公告)号：US11538994B2
公开(公告)日：2022-12-27
申请号：US16598910
申请日：2019-10-10
发明人： Jaesoo Ha , Suhwan Lee , Kwangtae Yu , Seungwook Chang
摘要： Provided is a mask assembly. The mask assembly includes a mask frame and a mask. The mask is coupled to the mask frame to distinguish first to third deposition areas from each other. Each of the first and third deposition areas has a first width greater than a reference width in a first direction and a second width less than the first width in a second direction. The second deposition area has a third width less than the first width in the first direction and a fourth width less than the reference width in the second direction.
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公开(公告)号：US20170117475A1
公开(公告)日：2017-04-27
申请号：US15130061
申请日：2016-04-15
发明人： Minsoo KIM , Mugyeom Kim , Valeriy Prushinskiy , Muhyun Kim , Dongkyu Lee , Byungkook Lee , Jaesoo Ha
CPC分类号： H01L51/0013 , C23C14/042 , C23C14/12 , C23C14/243 , C23C14/56 , H01L27/3211 , H01L51/56 , H01L2227/323
摘要： An apparatus for depositing an organic layer includes a deposition unit including a deposition assembly spaced apart from a substrate. The deposition assembly includes a deposition source configured to heat a deposition material, a deposition source nozzle unit installed on the deposition source, a plurality of pattern sheets facing the deposition source nozzle unit, and a source shutter disposed between the deposition source and the plurality of pattern sheets. The deposition source nozzle unit includes a deposition nozzle. The plurality of pattern sheets include at least one of a plurality of first patterning slits and a plurality of second patterning slits. The source shutter is configured to allow the deposition material to pass through one of the plurality of pattern sheets depending on a relative location between the deposition source and the substrate.
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公开(公告)号：US09905813B2
公开(公告)日：2018-02-27
申请号：US15164922
申请日：2016-05-26
发明人： Jaesoo Ha , Minsoo Kim , Mugyeom Kim , Muhyun Kim , Dongkyu Lee , Byungkook Lee , Suhwan Lee , Yonggu Lee , Jaeyoung Cho , Valeriy Prushinskiy
CPC分类号： H01L51/56 , B05B12/22 , B05B13/0221 , H01L21/67742 , H01L27/1214 , H01L27/3248 , H01L27/3262 , H01L51/001
摘要： An organic layer depositing apparatus includes a deposition unit which includes one or more deposition assemblies spaced a predetermined distance apart from a substrate to deposit a deposition material on the substrate, wherein the one or more deposition assemblies include: a deposition source; a deposition source nozzle unit; a first pattern sheet which includes a first patterning unit and a first overlap unit; and a second pattern sheet which includes a second patterning unit and a second overlap unit, wherein the first and second pattern sheets are arranged such that the first and second overlap units overlap each other.
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公开(公告)号：US11970763B2
公开(公告)日：2024-04-30
申请号：US16454183
申请日：2019-06-27
发明人： Suhwan Lee , Jaesoo Ha , Kwangtae Yu , Jinbaek Choi , Sangwoo Pyo
CPC分类号： C23C14/042 , C23C14/044 , C23C16/042 , H10K71/164 , H10K71/166
摘要： Provided are a hybrid-type mask stick and a mask frame assembly adopting the same. The mask frame assembly includes a mask frame; and a mask stick including a first mask stick extending in a first direction, a second mask stick extending in a second direction crossing the first direction, and a plurality of third mask sticks connected to the first mask stick and the second mask stick, the at least one first mask stick, the at least one second mask stick and the plurality of third mask sticks defining a plurality of deposition areas, wherein the first mask stick includes a first stick and a second stick arranged on the first stick, and at least one of the first stick and the second stick includes a partially-recessed portion in which the first mask stick is connected to the second mask stick.
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公开(公告)号：US20240295019A1
公开(公告)日：2024-09-05
申请号：US18582668
申请日：2024-02-21
发明人： Jaesoo Ha , Suhwan Lee , Sungho Seo , Kwangtae Yu
CPC分类号： C23C14/042 , H10K59/12 , H10K71/00 , H10K71/166
摘要： A hybrid mask stick and a mask frame assembly employing the same are provided. The mask frame assembly includes: a mask frame; and a mask stick assembly including a first mask stick that extends in a first direction, a second mask stick that extends in a second direction intersecting the first direction, and a plurality of third mask sticks that is coupled to ends of the first mask stick and the second mask stick and defines a plurality of deposition areas, wherein a thickness of the first mask stick is different from a thickness of the second mask stick, and a partial etching portion is arranged in a portion where the first mask stick and the second mask stick are coupled to each other.
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公开(公告)号：US11939657B2
公开(公告)日：2024-03-26
申请号：US16443520
申请日：2019-06-17
发明人： Jaesoo Ha , Suhwan Lee , Sungho Seo , Kwangtae Yu
CPC分类号： C23C14/042 , H10K59/12 , H10K71/00 , H10K71/166
摘要： A hybrid mask stick and a mask frame assembly employing the same are provided. The mask frame assembly includes: a mask frame; and a mask stick assembly including a first mask stick that extends in a first direction, a second mask stick that extends in a second direction intersecting the first direction, and a plurality of third mask sticks that is coupled to ends of the first mask stick and the second mask stick and defines a plurality of deposition areas, wherein a thickness of the first mask stick is different from a thickness of the second mask stick, and a partial etching portion is arranged in a portion where the first mask stick and the second mask stick are coupled to each other.
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公开(公告)号：US20200083451A1
公开(公告)日：2020-03-12
申请号：US16443520
申请日：2019-06-17
发明人： Jaesoo Ha , Suhwan Lee , Sungho Seo , Kwangtae Yu
摘要： A hybrid mask stick and a mask frame assembly employing the same are provided. The mask frame assembly includes: a mask frame; and a mask stick assembly including a first mask stick that extends in a first direction, a second mask stick that extends in a second direction intersecting the first direction, and a plurality of third mask sticks that is coupled to ends of the first mask stick and the second mask stick and defines a plurality of deposition areas, wherein a thickness of the first mask stick is different from a thickness of the second mask stick, and a partial etching portion is arranged in a portion where the first mask stick and the second mask stick are coupled to each other.
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