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    DISPLAY DEVICE
    1.
    发明申请
    DISPLAY DEVICE 有权

    公开(公告)号：US20220254850A1

    公开(公告)日：2022-08-11

    申请号：US17612111

    申请日：2020-01-17

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Hyoeng-Ki KIM ,  Hyeon-Bum LEE ,  Kwang-Woo PARK ,  Jin-Whan JUNG ,  Jong-Beom HONG

    IPC分类号： H01L27/32

    摘要： A display device includes a base substrate which is flexible, first and second active patterns disposed on the base substrate, an inorganic insulating layer disposed on the first and second active patterns and defining an opening area, a first organic insulating pattern disposed inside the opening area, a bridge electrode disposed on the first organic insulating pattern, a second organic insulating layer disposed on the bridge electrode, a fourth organic insulating layer disposed on the second organic insulating layer, first and second pixel electrodes disposed on the fourth organic insulating layer and electrically connected to the first and second active patterns, respectively, and a third organic insulating pattern disposed between the second organic insulating layer and the fourth organic insulating layer, overlapping the second pixel electrode, and not overlapping the first pixel electrode.

    DISPLAY SUBSTRATE HAVING A THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    3.
    发明申请
    DISPLAY SUBSTRATE HAVING A THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME 有权
    具有薄膜晶体管的显示基板及其制造方法

    公开(公告)号：US20150008426A1

    公开(公告)日：2015-01-08

    申请号：US14148386

    申请日：2014-01-06

    申请人： Samsung Display Co., LTD.

    发明人： Ki-Hyun CHO ,  Jeong-Won KIM ,  Kwang-Woo PARK ,  Chul-Won PARK

    IPC分类号： H01L27/12

    CPC分类号： H01L21/31116 ,  H01L21/31105 ,  H01L21/31111 ,  H01L27/1225 ,  H01L27/1248 ,  H01L27/127 ,  H01L27/1288 ,  H01L27/3244 ,  H01L27/3248 ,  H01L27/3258 ,  H01L27/326 ,  H01L27/3262 ,  H01L27/3276

    摘要： In a method for manufacturing a display substrate, a thin film transistor is formed on a base substrate. The thin film transistor includes a gate electrode, an active pattern, a source electrode and a drain electrode. A first passivation layer is formed to cover the thin film transistor. A second passivation layer is formed on the first passivation layer. A photoresist pattern is formed to partially expose the second passivation layer. The first passivation layer and the second passivation layer are partially removed to form a contact hole exposing the drain electrode. A pixel electrode layer is formed on the second passivation layer, the drain electrode and the photoresist pattern. A portion of the pixel electrode layer and the second photoresist pattern are removed to form a pixel electrode. The portion of the pixel electrode layer is disposed on a top surface and a sidewall of the photoresist pattern.

    摘要翻译： 在显示基板的制造方法中，在基底基板上形成薄膜晶体管。 薄膜晶体管包括栅电极，有源图案，源电极和漏电极。 形成第一钝化层以覆盖薄膜晶体管。 在第一钝化层上形成第二钝化层。 形成光致抗蚀剂图案以部分地暴露第二钝化层。 部分去除第一钝化层和第二钝化层以形成暴露漏电极的接触孔。 在第二钝化层，漏电极和光致抗蚀剂图案上形成像素电极层。 去除像素电极层和第二光致抗蚀剂图案的一部分以形成像素电极。 像素电极层的部分设置在光致抗蚀剂图案的顶表面和侧壁上。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    5.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    显示装置及其制造方法

    公开(公告)号：US20150255493A1

    公开(公告)日：2015-09-10

    申请号：US14604480

    申请日：2015-01-23

    申请人： Samsung Display Co., Ltd.

    发明人： Seung-Bo SHIM ,  Bong-Yeon KIM ,  Jun-hyuk WOO ,  Jeong-Won KIM ,  Kwang-Woo PARK

    IPC分类号： H01L27/12 ,  G03F1/26

    CPC分类号： H01L27/1288 ,  G03F1/26 ,  G03F1/32 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1248

    摘要： A display device includes a substrate comprising a display area and a non-display area. A gate line and a data line are disposed on the substrate. A thin film transistor is disposed on the display area and coupled to the gate line and the data line. A pad is disposed in the non-display area. A passivation layer is disposed on the thin film transistor and the pad. A pixel electrode is coupled to the thin film transistor. The passivation layer has a thickness that is smaller in the non-display area than in the display area, and the passivation layer has a thickness of about 0.1 μm to about 1 μm in the non-display area.

    摘要翻译： 显示装置包括包括显示区域和非显示区域的基板。 栅极线和数据线设置在基板上。 薄膜晶体管设置在显示区域上并耦合到栅极线和数据线。 在非显示区域中设置垫。 钝化层设置在薄膜晶体管和衬垫上。 像素电极耦合到薄膜晶体管。 钝化层的非显示区域的厚度比在显示区域中的厚度小，在非显示区域中钝化层的厚度为约0.1μm至约1μm。