公开(公告)号：US20250070098A1

公开(公告)日：2025-02-27

申请号：US18742621

申请日：2024-06-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeonghoon PARK ,  Wookjin LEE ,  Minchan KIM ,  Bongju LEE

IPC: H01L25/075

Abstract: A display apparatus includes a display module provided with a magnetic material; a frame configured to support the display module; and a connection device. The connection device includes: a fixing part fixed to the frame; an adjustment part movably coupled to the fixing part so as to be movable with respect to the fixing part; and an adjustment magnet movably coupled to the adjustment part so as to movable with respect to the adjustment part, and configured to generate an attractive force between the magnetic material and the adjustment magnet to mount the display module too the frame so that the display module is supported by the frame with a gap between the display module and the frame. The gap is adjustable by movement of the adjustment part with respect to the fixing part.

公开(公告)号：US20240320814A1

公开(公告)日：2024-09-26

申请号：US18432450

申请日：2024-02-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bongju LEE ,  Sangmin JUNG ,  Seunghwan YOO ,  Raehong YOUN ,  Namhoon LEE

IPC: G06T7/00 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67

CPC classification number: G06T7/0004 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67288 ,  G06T2207/20036 ,  G06T2207/20132 ,  G06T2207/30148

Abstract: A defect inspection or reduction apparatus includes a chamber moving a substrate and having an inner space therein, a laser oscillation structure irradiating a laser beam to a processing area of the substrate, a mask positioned in the laser oscillation structure and processing the laser beam, a beam profiler obtaining a beam image for the laser beam passing through the mask, and a damage detector detecting a defect area of the mask and the laser beam from the beam image. The damage detector includes an image pre-processing department performing a pre-processing on the beam image that is obtained from the beam profiler, an image extraction department extracting a defect area of the beam image on which the pre-processing is performed, and an image detector detecting a defect of the beam image based on the defect area.