公开(公告)号：US20230147992A1

公开(公告)日：2023-05-11

申请号：US18089691

申请日：2022-12-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-gil KANG ,  Min-seop PARK ,  Gon-jun KIM ,  Jae-jik BAEK ,  Jae-jin SHIN ,  In-hye JEONG

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/3213 ,  H01L21/311 ,  H01L21/02

CPC classification number: H01J37/32128 ,  H01L21/67028 ,  H01J37/32357 ,  H01L21/32136 ,  H01L21/31122 ,  H01L21/02595 ,  H01L21/02071 ,  H01J2237/3341

Abstract: A substrate processing apparatus includes a processing chamber; a susceptor provided in the processing chamber, wherein the susceptor is configured to support a substrate; a first plasma generator disposed on one side of the processing chamber; and a second plasma generator disposed on another side of the processing chamber, wherein the second plasma generator is configured to generate plasma by simultaneously supplying a sinusoidal wave signal and a non-sinusoidal wave signal to the susceptor. By using a substrate processing apparatus, a signal source device, and a method of processing a material layer according to the inventive concept, a smooth etched surface may be obtained for a crystalline material layer without a risk of device damage by RDC.

公开(公告)号：US20190393017A1

公开(公告)日：2019-12-26

申请号：US16448450

申请日：2019-06-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sung-gil KANG ,  Min-seop PARK ,  Gon-jun KIM ,  Jae-jik BAEK ,  Jae-jin SHIN ,  In-hye JEONG

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/02 ,  H01L21/3213 ,  H01L21/311

Abstract: A substrate processing apparatus includes a processing chamber; a susceptor provided in the processing chamber, wherein the susceptor is configured to support a substrate; a first plasma generator disposed on one side of the processing chamber; and a second plasma generator disposed on another side of the processing chamber, wherein the second plasma generator is configured to generate plasma by simultaneously supplying a sinusoidal wave signal and a non-sinusoidal wave signal to the susceptor. By using a substrate processing apparatus, a signal source device, and a method of processing a material layer according to the inventive concept, a smooth etched surface may be obtained for a crystalline material layer without a risk of device damage by RDC.

公开(公告)号：US20140337878A1

公开(公告)日：2014-11-13

申请号：US14246189

申请日：2014-04-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jae-jin SHIN ,  Hung-rok KWON ,  Min-chul JUNG

IPC: H04N21/438 ,  H04N21/4405 ,  H04N21/482 ,  H04N21/426

CPC classification number: H04N21/4384 ,  H04N21/42623 ,  H04N21/4263 ,  H04N21/4312 ,  H04N21/4405 ,  H04N21/44222 ,  H04N21/4821

Abstract: A broadcasting receiving apparatus includes a receiver having a plurality of tuners, a storage configured to store an image received by the receiver and a controller configured to control at least one of the tuners that does not tune to a currently viewed image out of the plurality of tuners, to alternately tune a plurality of channels for preset time, and controls the storage to store a channel information image corresponding to respective channels based on an image tuned to by the at least one tuner.

Abstract translation: 广播接收装置包括具有多个调谐器的接收机，被配置为存储由接收机接收的图像的存储器和被配置为控制不调谐到多个调谐器中的当前观看图像的调谐器中的至少一个的控制器 调谐器，以交替地调谐多个通道预设时间，并且基于由至少一个调谐器调谐到的图像来控制存储器存储与各个通道对应的频道信息图像。