公开(公告)号：US20160260813A1

公开(公告)日：2016-09-08

申请号：US14854272

申请日：2015-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eunae CHO ,  Dongjin LEE ,  Ji Eun LEE ,  Kyoung-Ho JUNG ,  Dong Su KO ,  Yongsu KIM ,  Jiho YOO ,  Sung HEO ,  Hyun PARK ,  Satoru YAMADA ,  Moonyoung JEONG ,  Sungjin KIM ,  Gyeongsu PARK ,  Han Jin LIM

IPC: H01L29/423 ,  H01L29/51 ,  H01L21/28 ,  H01L29/49

CPC classification number: H01L29/4236 ,  H01L21/28088 ,  H01L29/4966 ,  H01L29/513 ,  H01L29/517

Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.

Abstract translation: 提供半导体器件及其制造方法。 半导体器件包括包括沟槽的衬底。 半导体器件还包括设置在沟槽中的栅极电极和设置在衬底和栅电极之间的栅极绝缘膜。 栅电极包括栅极导体和金属元件，并且栅电极的有效功函数小于栅极导体的有效功函数。

公开(公告)号：US20220337764A1

公开(公告)日：2022-10-20

申请号：US17571682

申请日：2022-01-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ha Na CHOI ,  Hong Hyun JEON ,  Ji Eun LEE ,  Won Chul CHOI

IPC: H04N5/347 ,  H01L27/146 ,  H01L23/00 ,  H04N5/378 ,  H04N9/04

Abstract: An image sensor includes a pixel group. The pixel group includes a first color filter, first to third photodiodes below the first color filter such that the first color filter overlaps each of the first to third third photodiodes in a vertical direction, wherein the first to third photodiodes are arranged in a first direction perpendicular to the vertical direction, first to third floating diffusions configured to accumulate electric charges generated by the first to third photodiodes, respectively, a source follower transistor configured to output a first pixel signal based on the electric charges accumulated in at least one of the first to third floating diffusions, and a first metal layer configured to receive the first pixel signal from the source follower transistor, wherein the first metal layer extends in a second direction intersecting the first direction, wherein the first to third floating diffusions are arranged in the first direction.

公开(公告)号：US20230352548A1

公开(公告)日：2023-11-02

申请号：US18219525

申请日：2023-07-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eunae CHO ,  Dongjin LEE ,  Ji Eun LEE ,  Kyoung-Ho JUNG ,  Dong Su KO ,  Yongsu KIM ,  Jiho YOO ,  Sung HEO ,  Hyun PARK ,  Satoru YAMADA ,  Moonyoung JEONG ,  Sungjin KIM ,  Gyeongsu PARK ,  Han Jin LIM

IPC: H01L29/49 ,  H01L21/28 ,  H01L29/423 ,  H01L29/51

CPC classification number: H01L29/4236 ,  H01L21/28088 ,  H01L29/4966 ,  H01L29/513 ,  H01L29/517

Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.