SUBSTRATE PROCESSING APPARATUS
    1.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号:US20150217335A1

    公开(公告)日:2015-08-06

    申请号:US14687649

    申请日:2015-04-15

    IPC分类号: B08B3/02

    摘要: A method and apparatus capable of eliminating occurrence of a development failure when a DI water discharge nozzle 20 is scanned to dry a substrate by spinning. A substrate is held in a horizontal posture by a spin chuck and rotated about a vertical axis by a rotation motor, and when an outlet of the nozzle is scanned from a position opposed to a center of the substrate W to a position opposed to a circumferential edge while a cleaning solution being discharged, immediately after the nozzle has started to move, only one dried core is produced in the vicinity of the center of the substrate, and thus production of not less than two dried cores in the vicinity of the center of the substrate is prevented. The dried region is spread all over the surface of the substrate.

    摘要翻译: 当去除去离子水喷嘴20被扫描以通过纺丝干燥基材时,能够消除发生显影故障的方法和装置。 通过旋转卡盘将基板保持在水平姿态,并通过旋转马达绕垂直轴线旋转,并且当喷嘴的出口从与基板W的中心相对的位置扫描到与圆周方向相对的位置时 边缘,同时在喷嘴开始移动之后立即排出的清洁溶液在基板中心附近仅产生一个干燥的芯,从而在中心附近生产不少于两个干燥的芯 防止了基板。 干燥的区域遍布基底的整个表面。

    CELL POTENTIAL MEASUREMENT DEVICE

    公开(公告)号:US20220244210A1

    公开(公告)日:2022-08-04

    申请号:US17618720

    申请日:2020-06-22

    IPC分类号: G01N27/22

    摘要: A cell potential measurement device has a measuring plane on which a cell suspension is dropped. The cell potential measurement device includes a plurality of working electrodes and a reference electrode. The plurality of working electrodes are two-dimensionally arranged in a working region of the measuring plane. The reference electrode is provided outside the working area of the measuring plane. A contact angle in a hydrophobic region between the working region and the reference electrodes of the measuring plane is larger than a contact angle in the working region.