公开(公告)号：US20180093306A1

公开(公告)日：2018-04-05

申请号：US15721188

申请日：2017-09-29

Applicant: SEMES CO., LTD.

Inventor： Ki-Moon KANG ,  Anton KORIAKIN ,  In IL JUNG ,  Hae-Won CHOI

IPC: B08B7/00 ,  C11D11/00 ,  H01L21/311 ,  H01L21/67

CPC classification number: B08B7/0021 ,  C07C31/02 ,  C11D7/5022 ,  C11D11/0047 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67109 ,  H01L21/6719

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.