公开(公告)号：US11320752B2

公开(公告)日：2022-05-03

申请号：US16913039

申请日：2020-06-26

Applicant: SEMES CO., LTD.

Inventor： Jaeoh Bang

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/67

Abstract: A supporting unit is provided to support a substrate. The supporting unit includes a supporting plate including a pressure reducing fluid passage formed inside the supporting plate, and a flanger provided in a groove formed in a top surface of the supporting plate. A lower area of the flanger is connected to the pressure reducing fluid passage in the groove, and the flanger moves up and down by reduced pressure applied through the pressure reducing fluid passage.

公开(公告)号：US20240213079A1

公开(公告)日：2024-06-27

申请号：US18515867

申请日：2023-11-21

Applicant: SEMES CO., LTD.

Inventor： Jumi Lee ,  Jaeoh Bang ,  Minyoung KIM

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68757 ,  H01L21/67109 ,  H01L21/68742 ,  H01L21/6875

Abstract: Provided is a substrate heater including a support plate configured to be loaded with a substrate, an insulating layer arranged under the support plate, and a heating portion arranged under the insulating layer and configured to heat the support plate, wherein the insulating layer includes a plurality of layers, wherein at least two of the plurality of layers of the insulating layer have different thermal expansion coefficients from each other.

公开(公告)号：US11524315B2

公开(公告)日：2022-12-13

申请号：US17085691

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Jaeoh Bang ,  Kyungjin Seo ,  Youngseo An

IPC: B05C13/00 ,  B05C5/02

Abstract: An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.