公开(公告)号：US11524315B2

公开(公告)日：2022-12-13

申请号：US17085691

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Jaeoh Bang ,  Kyungjin Seo ,  Youngseo An

IPC: B05C13/00 ,  B05C5/02

Abstract: An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.

公开(公告)号：US11776826B2

公开(公告)日：2023-10-03

申请号：US16999836

申请日：2020-08-21

Applicant: SEMES CO., LTD.

Inventor： Junho Kim ,  Kyungsik Shin ,  Youngseo An ,  Jinki Shin ,  Man Kyu Kang ,  Yoonki Sa

IPC: H01L21/67 ,  H01L21/683

CPC classification number: H01L21/67109 ,  H01L21/67017 ,  H01L21/67161 ,  H01L21/683

Abstract: An apparatus for treating a substrate includes a process chamber having a process space therein, a support unit that supports the substrate in the process space, a heating member that heats the substrate supported on the support unit, and an exhaust unit that evacuates the process space. The exhaust unit includes an exhaust duct and a heat retention unit having a retention space that retains heat released from the process space. The retention space surrounds an adjacent area located adjacent to the process chamber in the exhaust duct.