公开(公告)号：US11557477B2

公开(公告)日：2023-01-17

申请号：US16896535

申请日：2020-06-09

Applicant: SEMES CO., LTD.

Inventor： Min Jung Park ,  Kyungjin Seo ,  Younghun Jung

IPC: H01L21/033 ,  H01L21/67 ,  B01J35/00

Abstract: An apparatus for treating a substrate includes a heat treatment chamber having an interior space, a housing that is provided in the interior space and that has a treatment space therein, a gas supply line that supplies, into the treatment space, a hydrophobic gas for hydrophobicizing the substrate, and a decomposition unit that decomposes an alkaline gas leaking from the treatment space to the interior space.

公开(公告)号：US11524315B2

公开(公告)日：2022-12-13

申请号：US17085691

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Jaeoh Bang ,  Kyungjin Seo ,  Youngseo An

IPC: B05C13/00 ,  B05C5/02

Abstract: An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.

公开(公告)号：US11340533B2

公开(公告)日：2022-05-24

申请号：US17380308

申请日：2021-07-20

Applicant: SEMES CO., LTD.

Inventor： Min Jung Park ,  Jung Yul Lee ,  Choongki Min ,  Kyungjin Seo

IPC: G03F7/20

Abstract: The inventive concept provides a substrate treating apparatus and a substrate treating method. The sub substrate treating apparatus may include a support unit that supports a substrate, a liquid supply unit that supplies a liquid onto the substrate supported by the support unit, and a controller that controls the liquid supply unit and the support unit, the liquid supply unit may include a pre-treatment nozzle that discharges a first treatment liquid in a stream scheme, and a main nozzle that discharges a second treatment liquid in a liquid curtain scheme, and the controller may control the support unit such that a rotational direction of the substrate when the first treatment liquid is discharged from the main nozzle and a rotational direction of the substrate when the second treatment liquid is discharged from the pre-treatment nozzle are opposite to each other.