公开(公告)号：US12198943B2

公开(公告)日：2025-01-14

申请号：US17133104

申请日：2020-12-23

Applicant: SEMES CO., LTD.

Inventor： Junhee Youn ,  Seung Hwan Cho

IPC: H01L21/67 ,  B08B3/08 ,  C02F1/58 ,  C02F1/72 ,  C02F1/78 ,  B08B3/14 ,  C02F1/34 ,  C02F101/10 ,  C02F103/34

Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.

公开(公告)号：US10453672B2

公开(公告)日：2019-10-22

申请号：US15297728

申请日：2016-10-19

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang ,  Junhee Youn ,  Kilsung Kwon

IPC: B08B3/14 ,  H01L21/02 ,  B01D19/00 ,  B08B3/08 ,  B08B3/10 ,  C02F1/20 ,  H01L21/67 ,  C02F103/34

Abstract: Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved ozone to exit from the liquid by energy or radical ions that are generated while the micro bubbles are dissolved in the liquid.

公开(公告)号：US20210114902A1

公开(公告)日：2021-04-22

申请号：US17133104

申请日：2020-12-23

Applicant: SEMES CO., LTD.

Inventor： Junhee Youn ,  Seung Hwan Cho

IPC: C02F1/72 ,  H01L21/67 ,  C02F1/34 ,  B08B3/08 ,  B08B3/14

Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.

公开(公告)号：US20180111860A1

公开(公告)日：2018-04-26

申请号：US15791975

申请日：2017-10-24

Applicant: SEMES CO., LTD.

Inventor： Junhee Youn ,  Seung Hwan Cho

IPC: C02F1/72 ,  B08B3/08 ,  B08B3/14 ,  H01L21/67

CPC classification number: C02F1/727 ,  B08B3/08 ,  B08B3/14 ,  C02F1/34 ,  C02F2101/10 ,  C02F2103/346 ,  C02F2301/024 ,  C02F2301/046 ,  C02F2303/18 ,  H01L21/67017 ,  H01L21/67051

Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.