SUPPORT UNIT AND SUBSTRATE TREATING DEVICE INCLUDING THE SAME
    1.
    发明申请
    SUPPORT UNIT AND SUBSTRATE TREATING DEVICE INCLUDING THE SAME 有权
    支持单元和基板处理设备,包括它们

    公开(公告)号:US20150116689A1

    公开(公告)日:2015-04-30

    申请号:US14527606

    申请日:2014-10-29

    Abstract: Provided is a method of manufacturing a support unit that supports a substrate. The method includes: providing a support plate formed of a non-conductive material and supporting a substrate; providing a base plate disposed below the support plate and formed of a material including a conductive material; and depositing a metallic layer at a bottom of the support plate and coupling the metallic layer and the base plate through brazing.

    Abstract translation: 提供一种制造支撑基板的支撑单元的方法。 该方法包括:提供由非导电材料形成并支撑基板的支撑板; 提供设置在所述支撑板下方并由包括导电材料的材料形成的基板; 以及在所述支撑板的底部沉积金属层,并通过钎焊将所述金属层和所述基板联接。

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