公开(公告)号：US20230350304A1

公开(公告)日：2023-11-02

申请号：US17732565

申请日：2022-04-29

Applicant: SEMES CO, LTD.

Inventor： Hae Won CHOI ,  Joon Ho WON ,  Koriakin ANTON ,  Ki Hoon CHOI ,  Eung Su KIM ,  Pil Kyun HEO ,  Min Woo KIM ,  Jin Yeong SUNG ,  Hyo Soo KIM

IPC: G03F7/30 ,  G03F7/32

CPC classification number: G03F7/3021 ,  G03F7/327

Abstract: There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.

公开(公告)号：US20230113184A1

公开(公告)日：2023-04-13

申请号：US17865386

申请日：2022-07-15

Applicant: SEMES CO., LTD.

Inventor： Jae Won SHIN ,  Jae Seong LEE ,  Hae Won CHOI ,  Joon Ho WON ,  Koriakin ANTON ,  Min Woo KIM ,  Hyung Seok KANG ,  Eung Su KIM ,  Pil Kyun HEO ,  Jin Yeong SUNG

IPC: H01L21/67

Abstract: The present disclosure relates to a flow resistance generating unit that generates a flow resistance in a pipe to solve a flow imbalance problem due to a bent pipe and stabilizes an internal airflow, and a substrate treating apparatus including the same. The substrate treating apparatus comprises a fluid supply unit for supplying fluid for treating a substrate and including an upper fluid supply module for supplying the fluid to an upper portion of the substrate, a lower fluid supply module for supplying the fluid to a lower portion of the substrate, and a supply pipe connected to at least one of the upper fluid supply module and the lower fluid supply module, and a flow resistance generating unit installed in the supply pipe and for generating a flow resistance with respect to the fluid passing through the supply pipe.