APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

    公开(公告)号:US20230350304A1

    公开(公告)日:2023-11-02

    申请号:US17732565

    申请日:2022-04-29

    Applicant: SEMES CO, LTD.

    CPC classification number: G03F7/3021 G03F7/327

    Abstract: There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.

    METHOD AND APPARATUS FOR TREATING A SUBSTRATE

    公开(公告)号:US20220290921A1

    公开(公告)日:2022-09-15

    申请号:US17692395

    申请日:2022-03-11

    Abstract: The inventive concept provides a method for treating a substrate. The method for treating a substrate comprises: a pressurization step for increasing a pressure of an inner space of a chamber by supplying a treating fluid to the inner space, after taking the substrate into the inner space; a flow step for generating a flow of the treating fluid by combination of supplying and discharging the treating fluid to and from the inner space; and a depressurization step of decreasing the pressure of the inner space by discharging the treating fluid from the inner space, and wherein the pressurization step comprises: a bottom side supply process for increasing the pressure of the inner space by supplying the treating fluid to a backside of the substrate taken into the inner space;
    and a top side supply process of increasing the pressure of the inner space by supplying the treating fluid to a top side of the substrate taken into the inner space.

    SEMICONDUCTOR PACKAGE TEST APPARATUS

    公开(公告)号:US20210003631A1

    公开(公告)日:2021-01-07

    申请号:US16915179

    申请日:2020-06-29

    Abstract: A semiconductor package test apparatus is disclosed. The semiconductor package test apparatus includes an interface board having connection terminals for electrically connecting a semiconductor package to a tester, a push block for pressing the semiconductor package toward the interface board to bring external terminals of the semiconductor package into contact with the connection terminals of the interface board, a temperature adjustment unit connected with the push block to heat or cool the semiconductor package to a test temperature through the push block, and a heat transfer member for thermally connecting the push block and the interface board.

Patent Agency Ranking