公开(公告)号：US20220384216A1

公开(公告)日：2022-12-01

申请号：US17714999

申请日：2022-04-06

Applicant: SEMES CO., LTD.

Inventor： Jin Se PARK ,  Ki Bong KIM ,  Myung Seok CHA ,  Do Hyeon YOON

IPC: H01L21/67

Abstract: The present invention discloses an exhausting device and an exhausting method in substrate processing equipment, and more particularly, a technique for controlling a processing process environment by providing a buffer space for storing chemical fumes outside a ventilation unit of the substrate processing equipment, and discharging the chemical fumes into the buffer space in accordance with a processing process in a chamber interior space.

公开(公告)号：US20230081833A1

公开(公告)日：2023-03-16

申请号：US17892214

申请日：2022-08-22

Applicant: SEMES CO., LTD.

Inventor： Jin Woo JUNG ,  Myung Seok CHA

IPC: H01L21/02 ,  H01L21/67

Abstract: Provided is a substrate treating apparatus including: a fluid supply unit supplying a supercritical fluid to the treatment space, a plurality of components installed in the fluid supply line; and a detection member detecting whether or not metal particles are released from the component. The detection member includes: an upstream detection port connected to the fluid supply line upstream from a first component which is one of the plurality of components; a downstream detection port connected to the fluid supply line downstream from the first component; and a detector provided to be coupled to a selected detection port between the upstream detection port and the downstream detection port, and detecting metal particles from a fluid flowing through the detection port from the fluid supply line.

公开(公告)号：US20240203726A1

公开(公告)日：2024-06-20

申请号：US18241893

申请日：2023-09-03

Applicant: SEMES CO., LTD.

Inventor： Myung Seok CHA ,  Ki Bong KIM ,  Yong Hyun CHOI ,  Ju Yeon SONG

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/02101 ,  H01L21/02057 ,  H01L21/67034 ,  H01L21/67748 ,  H01L21/6776

Abstract: Proposed are an organic solvent supplying apparatus, a substrate processing method, and a substrate processing apparatus. An organic solvent supplying apparatus according to an embodiment supplies an organic solvent to a liquid processing chamber of a substrate processing apparatus, the substrate processing apparatus including the liquid processing chamber for supplying the organic solvent to a substrate and a supercritical processing chamber for drying the substrate coated with the organic solvent using supercritical fluid. The organic solvent supplying apparatus includes a supply tank for storing the organic solvent, a supply line connected to the supply tank and the liquid processing chamber, and a cooling module provided on the supply line.