公开(公告)号：US20200051784A1

公开(公告)日：2020-02-13

申请号：US16530468

申请日：2019-08-02

Applicant: SEMES CO., LTD.

Inventor： Ogsen GALSTYAN ,  Young-Bin Kim ,  Jamyung GU ,  Jong-Hwan An

IPC: H01J37/32 ,  H05H1/00

Abstract: A substrate treating apparatus includes a chamber having a space therein in which a substrate is treated, a support unit that supports the substrate in the chamber, a gas supply unit that supplies gas into the chamber, and a plasma generation unit that excites the gas in the chamber into a plasma state. The plasma generation unit includes a high-frequency power supply, a first antenna connected to one end of the high-frequency power supply, a second antenna connected with the first antenna in parallel, and a current divider that distributes electric current to the first antenna and the second antenna. The current divider includes a first capacitor disposed between the first antenna and the second antenna, a second capacitor connected with the second antenna in parallel, and a third capacitor connected with the second antenna in series. The second capacitor and the third capacitor are implemented with a variable capacitor.

公开(公告)号：US20180315580A1

公开(公告)日：2018-11-01

申请号：US15962487

申请日：2018-04-25

Applicant: SEMES CO., LTD.

Inventor： Harutyun MELIKYAN ,  Ogsen GALSTYAN ,  Junghwan LEE ,  Jong Hwan AN ,  Shin-Woo NAM

IPC: H01J37/32 ,  H03H7/40

CPC classification number: H01J37/32174 ,  H01J37/321 ,  H03H7/40

Abstract: Disclosed inventions are apparatus for supplying power and an apparatus for treating a substrate including the same. The apparatus for supplying power includes a high-frequency power source that provides a high-frequency power; a plasma source including first and second antennas that generates plasma by using the high-frequency power; and a power divider connected between the high-frequency power source and the plasma source to divide the high-frequency power supplied to the first and second antennas. The power divider includes a first variable device that controls the high-frequency power supplied to the first and second antennas; and a second variable device that compensates for non-linearity of the high-frequency power supplied to the first and second antennas.

公开(公告)号：US20220181118A1

公开(公告)日：2022-06-09

申请号：US17540742

申请日：2021-12-02

Applicant: SEMES CO., LTD.

Inventor： Ogsen GALSTYAN ,  Shant ARAKELYAN ,  Young-Bin KIM ,  Youn Gun BONG ,  Jong-Hwan AN

IPC: H01J37/32

Abstract: Disclosed is an apparatus for treating a substrate. The apparatus may include a chamber having a space for treating the substrate therein; a support unit supporting the substrate in the chamber; a gas supply unit supplying gas into the chamber; and a plasma generation unit exciting the gas in the chamber into a plasma state, wherein the plasma generation unit may include high frequency power supply; a first antenna; a second antenna; and a matcher connected between the high frequency power supply and the first and second antennas, wherein the matcher may include a current distributor distributing a current to the first antenna and the second antenna, and the current distributor includes a first capacitor disposed between the first antenna and the second antenna; a second capacitor connected with the second antenna in series; and a third capacitor connected with the second antenna in parallel, wherein the first capacitor and the second capacitor may be provided as variable capacitors.

公开(公告)号：US20200373125A1

公开(公告)日：2020-11-26

申请号：US16880221

申请日：2020-05-21

Applicant: SEMES CO., LTD.

Inventor： Ogsen GALSTYAN ,  Hyo Seong SEONG ,  Byeung Geon JEON ,  Jong Hwan AN

IPC: H01J37/32 ,  H03H7/01 ,  H01L21/683

Abstract: A substrate treating apparatus is disclosed. The substrate treating apparatus may include a chamber having a treating space defined therein, a support unit for supporting the substrate in the treating space, a heater power source for applying electric power to a heater in the support unit, a high-frequency power source for applying high-frequency power to a lower electrode in the support unit, and a filter unit installed at a line for connecting the heater power source with the heater to prevent high-frequency inflow. The filter unit may include a housing, one or more coils in the housing, and an adjustment member disposed between the housing and the coil. The adjustment member may be made of a non-magnetic material. The adjustment member may be spaced from the coil at a predefined spacing, and spaced apart from an inner wall of the housing or in contact with the housing inner wall.