公开(公告)号：US20200051784A1

公开(公告)日：2020-02-13

申请号：US16530468

申请日：2019-08-02

Applicant: SEMES CO., LTD.

Inventor： Ogsen GALSTYAN ,  Young-Bin Kim ,  Jamyung GU ,  Jong-Hwan An

IPC: H01J37/32 ,  H05H1/00

Abstract: A substrate treating apparatus includes a chamber having a space therein in which a substrate is treated, a support unit that supports the substrate in the chamber, a gas supply unit that supplies gas into the chamber, and a plasma generation unit that excites the gas in the chamber into a plasma state. The plasma generation unit includes a high-frequency power supply, a first antenna connected to one end of the high-frequency power supply, a second antenna connected with the first antenna in parallel, and a current divider that distributes electric current to the first antenna and the second antenna. The current divider includes a first capacitor disposed between the first antenna and the second antenna, a second capacitor connected with the second antenna in parallel, and a third capacitor connected with the second antenna in series. The second capacitor and the third capacitor are implemented with a variable capacitor.

公开(公告)号：US20180102238A1

公开(公告)日：2018-04-12

申请号：US15702119

申请日：2017-09-12

Applicant: SEMES CO., LTD.

Inventor： Jamyung GU ,  Jong Hwan AN ,  Shin-Woo NAM ,  Sooryun RO

IPC: H01J37/32 ,  H02N13/00 ,  H03H7/38 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32449 ,  H01J37/32477 ,  H01J37/32522 ,  H01J37/32715 ,  H01J2237/0203 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H02N13/00 ,  H03H7/38

Abstract: A substrate treating apparatus includes a chamber having a treatment space in the interior thereof, a support unit that supports a substrate in the treatment space, a gas supply unit configured to supply a treatment gas into the treatment space, and a plasma source configured to generate plasma from the treatment gas. The support unit includes an electrostatic chuck, on which the substrate is positioned, a first ring surrounding a circumference of the substrate positioned on the electrostatic chuck, a second ring surrounding a circumference of the electrostatic chuck and formed of an insulation material, an insertion body disposed in the second ring and formed of a conductive material, and an impedance control unit configured to adjust an impedance of the insertion body.