公开(公告)号：US20230068295A1

公开(公告)日：2023-03-02

申请号：US17870840

申请日：2022-07-22

Applicant: SEMES CO., LTD.

Inventor： Sung Ho KIM ,  Yoon Ok Jang ,  Bo Yeon Hwang ,  Hyun Min Lee ,  Kwang Jun Choi

IPC: B41J2/16 ,  B41J2/205 ,  B41J2/21

Abstract: A substrate processing apparatus and a substrate processing method are provided, which can improve the yield by minimizing the occurrence of stains. The substrate processing method includes forming on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate by using a plurality of nozzles, calculating the density of each of the plurality of ink patterns, and selecting at least one nozzle for jetting ink into one pixel area based on respectively calculated densities of the plurality of ink patterns.

公开(公告)号：US11789305B2

公开(公告)日：2023-10-17

申请号：US16924088

申请日：2020-07-08

Applicant: SEMES CO., LTD.

Inventor： Han Lim Kang ,  Yoon Ok Jang ,  Jun Seok Lee ,  Hyun Min Lee

IPC: G02F1/1335 ,  G02B5/22 ,  G02F1/1333 ,  G03F7/20

CPC classification number: G02F1/133516 ,  G02B5/223 ,  G02F1/133377 ,  G02F1/133512 ,  G03F7/202 ,  G03F7/2018

Abstract: A substrate, a display panel, and a substrate manufacturing method are proposed. The substrate includes a base layer; partitioning walls located on the base layer and dividing the base layer into a plurality of pixel regions, and patterns located in each of the pixel regions of the base layer, and guiding spread of a liquid drop discharged to the base layer.

公开(公告)号：US11787171B2

公开(公告)日：2023-10-17

申请号：US17337967

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Yoon Ok Jang ,  Hyun Min Lee ,  Jun Seok Lee ,  Kwang Jun Choi

IPC: B41J2/045 ,  B41J3/407

CPC classification number: B41J2/04505 ,  B41J2/04508 ,  B41J2/04551 ,  B41J2/04558 ,  B41J3/407

Abstract: An ink impact point correction apparatus for automatically measuring and correcting an impact point of ink using a pattern on a substrate, on which a coordinate system is displayed, and a substrate treating system including the same are provided. The ink impact point correction apparatus includes a recognition unit for acquiring information on the impact point of ink at a plurality of points located on a substrate; and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point, wherein a coordinate pattern in the form of a coordinate system is formed at the plurality of points.

公开(公告)号：US12011934B2

公开(公告)日：2024-06-18

申请号：US17870840

申请日：2022-07-22

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Yoon Ok Jang ,  Bo Yeon Hwang ,  Hyun Min Lee ,  Kwang Jun Choi

IPC: B41J2/205 ,  B41J2/21

CPC classification number: B41J2/2054 ,  B41J2/2132 ,  B41J2/2142

Abstract: A substrate processing apparatus and a substrate processing method are provided, which can improve the yield by minimizing the occurrence of stains. The substrate processing method includes forming on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate by using a plurality of nozzles, calculating the density of each of the plurality of ink patterns, and selecting at least one nozzle for jetting ink into one pixel area based on respectively calculated densities of the plurality of ink patterns.

公开(公告)号：US20220009224A1

公开(公告)日：2022-01-13

申请号：US17337967

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Yoon Ok Jang ,  Hyun Min Lee ,  Jun Seok Lee ,  Kwang Jun Choi

IPC: B41J2/045

Abstract: An ink impact point correction apparatus for automatically measuring and correcting an impact point of ink using a pattern on a substrate, on which a coordinate system is displayed, and a substrate treating system including the same are provided. The ink impact point correction apparatus includes a recognition unit for acquiring information on the impact point of ink at a plurality of points located on a substrate; and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point, wherein a coordinate pattern in the form of a coordinate system is formed at the plurality of points.

公开(公告)号：US11161337B2

公开(公告)日：2021-11-02

申请号：US16920359

申请日：2020-07-02

Applicant: SEMES CO., LTD.

Inventor： Han Lim Kang ,  Yoon Ok Jang ,  Jun Seok Lee ,  Hyun Min Lee

IPC: B41J2/045

Abstract: A liquid drop discharge apparatus is proposed. The liquid drop discharge apparatus includes: an inkjet head discharging ink to each of pixels of a substrate; a laser emitter coupled to the inkjet head, and emitting an aiming laser beam by which a discharged position of a liquid drop from the inkjet head to each of the pixels is aimed; a camera capturing an emitted position of the aiming laser beam on the substrate; and a position alignment unit aligning a position of the inkjet head on the basis of image data obtained from the shooting unit.