公开(公告)号：US20220009224A1

公开(公告)日：2022-01-13

申请号：US17337967

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Yoon Ok Jang ,  Hyun Min Lee ,  Jun Seok Lee ,  Kwang Jun Choi

IPC: B41J2/045

Abstract: An ink impact point correction apparatus for automatically measuring and correcting an impact point of ink using a pattern on a substrate, on which a coordinate system is displayed, and a substrate treating system including the same are provided. The ink impact point correction apparatus includes a recognition unit for acquiring information on the impact point of ink at a plurality of points located on a substrate; and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point, wherein a coordinate pattern in the form of a coordinate system is formed at the plurality of points.

公开(公告)号：US11161337B2

公开(公告)日：2021-11-02

申请号：US16920359

申请日：2020-07-02

Applicant: SEMES CO., LTD.

Inventor： Han Lim Kang ,  Yoon Ok Jang ,  Jun Seok Lee ,  Hyun Min Lee

IPC: B41J2/045

Abstract: A liquid drop discharge apparatus is proposed. The liquid drop discharge apparatus includes: an inkjet head discharging ink to each of pixels of a substrate; a laser emitter coupled to the inkjet head, and emitting an aiming laser beam by which a discharged position of a liquid drop from the inkjet head to each of the pixels is aimed; a camera capturing an emitted position of the aiming laser beam on the substrate; and a position alignment unit aligning a position of the inkjet head on the basis of image data obtained from the shooting unit.

公开(公告)号：US11787171B2

公开(公告)日：2023-10-17

申请号：US17337967

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Yoon Ok Jang ,  Hyun Min Lee ,  Jun Seok Lee ,  Kwang Jun Choi

IPC: B41J2/045 ,  B41J3/407

CPC classification number: B41J2/04505 ,  B41J2/04508 ,  B41J2/04551 ,  B41J2/04558 ,  B41J3/407

Abstract: An ink impact point correction apparatus for automatically measuring and correcting an impact point of ink using a pattern on a substrate, on which a coordinate system is displayed, and a substrate treating system including the same are provided. The ink impact point correction apparatus includes a recognition unit for acquiring information on the impact point of ink at a plurality of points located on a substrate; and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point, wherein a coordinate pattern in the form of a coordinate system is formed at the plurality of points.

公开(公告)号：US11789305B2

公开(公告)日：2023-10-17

申请号：US16924088

申请日：2020-07-08

Applicant: SEMES CO., LTD.

Inventor： Han Lim Kang ,  Yoon Ok Jang ,  Jun Seok Lee ,  Hyun Min Lee

IPC: G02F1/1335 ,  G02B5/22 ,  G02F1/1333 ,  G03F7/20

CPC classification number: G02F1/133516 ,  G02B5/223 ,  G02F1/133377 ,  G02F1/133512 ,  G03F7/202 ,  G03F7/2018

Abstract: A substrate, a display panel, and a substrate manufacturing method are proposed. The substrate includes a base layer; partitioning walls located on the base layer and dividing the base layer into a plurality of pixel regions, and patterns located in each of the pixel regions of the base layer, and guiding spread of a liquid drop discharged to the base layer.

公开(公告)号：US11867999B2

公开(公告)日：2024-01-09

申请号：US17405667

申请日：2021-08-18

Applicant: SEMES CO., LTD.

Inventor： Jun Seok Lee ,  Yoon-Ok Jang ,  Sung Ho Kim ,  Kwang Jun Choi ,  Hyun Min Lee

IPC: G02F1/1335

CPC classification number: G02F1/133514 ,  G02F1/133516 ,  B41J2202/09

Abstract: A color filter is provided. The color filter includes a substrate, a bank formed on a substrate to partition a plurality of pixel units into each other, a plurality of first structures formed on the pixel unit, and having a width narrower than a width of the pixel unit, and a height lower than a height of the bank, and an ink film filled in the pixel unit and having a height higher than the height of the first structures.

公开(公告)号：US11762009B2

公开(公告)日：2023-09-19

申请号：US17406751

申请日：2021-08-19

Applicant: SEMES CO., LTD.

Inventor： Hyon Jin Lee ,  Jun Seok Lee

IPC: G01R31/26 ,  H01L21/677 ,  H01L21/673

CPC classification number: G01R31/2642 ,  H01L21/67745 ,  H01L21/67333

Abstract: A chamber module and a test handler including the same are disclosed. The chamber module includes a soak chamber providing a temperature adjusting space for adjusting a temperature of semiconductor devices, an elevating member disposed in the soak chamber and for elevating a tray in which the semiconductor devices are accommodated, a guide member extending in a vertical direction in the soak chamber and for guiding movement of the elevating member, and a temperature adjusting part for adjusting a temperature of the guide member.

公开(公告)号：US11707944B2

公开(公告)日：2023-07-25

申请号：US17407936

申请日：2021-08-20

Applicant: SEMES CO., LTD.

Inventor： Jun Seok Lee ,  Yoon-Ok Jang ,  Sung Ho Kim ,  Kwang Jun Choi ,  Hyun Min Lee

IPC: B41M1/34 ,  B41J2/165 ,  B41M7/00

CPC classification number: B41M7/0018 ,  B41M1/34

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus may include a stage including an accommodation area, onto or from which a substrate is loaded or unloaded, and a treatment area, in which the substrate is treated, a liquid discharge head that supplies a treatment liquid to the substrate, and a liquid receiving part that receives the treatment liquid pre-discharged by the liquid discharge head in the treatment area.