公开(公告)号：US20230166285A1

公开(公告)日：2023-06-01

申请号：US18060030

申请日：2022-11-30

申请人： SEMES CO., LTD.

发明人： Yun Sang Kim ,  Yoon Seok Choi ,  Young Dae Chung ,  Soon-Cheon Cho ,  Se Hoon Oh

IPC分类号： B05C5/02 ,  B05C13/02 ,  H05B6/78 ,  H05B6/80

CPC分类号： B05C5/02 ,  B05C13/02 ,  H05B6/78 ,  H05B6/80 ,  H05B2206/04

摘要： Provided are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a chamber for providing a processing space; a substrate support unit provided in the processing space to support a substrate and rotate the substrate; a liquid supply unit including a chemical liquid discharge nozzle that discharges a chemical liquid to the substrate supported by the substrate support unit; and a microwave applying member for emitting microwaves to the substrate.

公开(公告)号：US20230369021A1

公开(公告)日：2023-11-16

申请号：US18135740

申请日：2023-04-18

申请人： SEMES CO., LTD.

发明人： Yoon Seok Choi ,  Yun Sang Kim ,  Youn Gun Bong ,  Jae Won Shin ,  Jong Won Park

IPC分类号： H01J37/32

CPC分类号： H01J37/3222 ,  H01J37/32568 ,  H01J37/32229 ,  H01J37/32238 ,  H01J37/32633 ,  H01J2237/334

摘要： A substrate treating apparatus is provided to provide heating and plasma treatment of a substrate in a single device, and the substrate treating apparatus includes a treatment container in which a substrate is accommodated, a support member supporting the substrate in the treatment container, a plasma providing unit including an electrode generating plasma within the treatment container, and a microwave introducing unit connected to a microwave generating unit and introducing microwaves into the treatment container.