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公开(公告)号:US11981995B2
公开(公告)日:2024-05-14
申请号:US17086061
申请日:2020-10-30
Applicant: SEMES CO., LTD.
Inventor: Yong Hoon Hong , Dohyeon Yoon , Heehwan Kim , Ji Young Lee , Young Su Kim
IPC: C23C16/448 , C23C16/44 , C23C16/455 , C23C16/52 , H01L21/67 , B05B5/00 , B05B5/053
CPC classification number: C23C16/4485 , C23C16/4412 , C23C16/45563 , C23C16/52 , H01L21/67 , B05B5/002 , B05B5/0533 , H01L21/67017 , H01L21/67051
Abstract: A chemical supply apparatus includes an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto, a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical passes through the filter unit, a liquefaction unit disposed downstream of the filter unit to liquefy the vaporized chemical, and a chemical storage tank disposed downstream of the liquefaction unit to store the liquefied chemical therein, wherein an electrode is disposed between the chemical supply source and the liquefaction unit, wherein the electrode electrically reacts with the chemical or particles in the chemical to change electrical properties of the chemical or the particles.
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公开(公告)号:US11664212B2
公开(公告)日:2023-05-30
申请号:US17239091
申请日:2021-04-23
Applicant: SEMES CO., LTD.
Inventor: Yong Hoon Hong , Sul Lee , Myung A Jeon , Moonsik Choi , Young Su Kim
IPC: H01L21/02 , H01L21/263
CPC classification number: H01L21/02057 , H01L21/02282 , H01L21/2636
Abstract: The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.
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