公开(公告)号：US11981995B2

公开(公告)日：2024-05-14

申请号：US17086061

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon Hong ,  Dohyeon Yoon ,  Heehwan Kim ,  Ji Young Lee ,  Young Su Kim

IPC: C23C16/448 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/67 ,  B05B5/00 ,  B05B5/053

CPC classification number: C23C16/4485 ,  C23C16/4412 ,  C23C16/45563 ,  C23C16/52 ,  H01L21/67 ,  B05B5/002 ,  B05B5/0533 ,  H01L21/67017 ,  H01L21/67051

Abstract: A chemical supply apparatus includes an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto, a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical passes through the filter unit, a liquefaction unit disposed downstream of the filter unit to liquefy the vaporized chemical, and a chemical storage tank disposed downstream of the liquefaction unit to store the liquefied chemical therein, wherein an electrode is disposed between the chemical supply source and the liquefaction unit, wherein the electrode electrically reacts with the chemical or particles in the chemical to change electrical properties of the chemical or the particles.

公开(公告)号：US10825699B2

公开(公告)日：2020-11-03

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： Buyoung Jung ,  Jonghan Kim ,  Young Jin Jang ,  Jin Tack Yu ,  Youngjun Choi ,  Daehun Kim ,  Byungsun Bang ,  Jonghyeon Woo ,  Heehwan Kim ,  Cheol-Yong Shin ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

公开(公告)号：US10109506B2

公开(公告)日：2018-10-23

申请号：US15604141

申请日：2017-05-24

Applicant: SEMES CO., LTD.

Inventor： Heehwan Kim ,  Young Hun Lee

IPC: H01L21/67 ,  H01L21/02

Abstract: Provided is an apparatus and method for supplying a fluid. The substrate treating apparatus comprises a treating unit for treating a substrate and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises a supply tank in which the fluid is stored, a supply line connecting the supply tank and the treating unit to supply the fluid from the supply tank to the treating unit, a filter installed on the supply line, and an exhaust line branching from the supply line, wherein a branch point of the exhaust line in the supply line is located upstream of the filter.

公开(公告)号：US11424139B2

公开(公告)日：2022-08-23

申请号：US17026504

申请日：2020-09-21

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon Hong ,  Heehwan Kim ,  Ji Young Lee

IPC: B08B3/08 ,  B08B13/00 ,  H01L21/67 ,  H01L21/687

Abstract: The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate and a nozzle unit having a nozzle that dispenses a chemical onto the substrate, in which the nozzle is connected with a ground line, and a variable resistor is provided on the ground line.

公开(公告)号：US10304687B2

公开(公告)日：2019-05-28

申请号：US15655055

申请日：2017-07-20

Applicant: SEMES CO., LTD.

Inventor： Soyoung Park ,  Heehwan Kim

IPC: B08B3/02 ,  B08B3/04 ,  B08B3/08 ,  B08B3/10 ,  H01L21/02 ,  H01L21/67 ,  H01L21/304 ,  H01L21/687

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a spin head configured to support the substrate, a cup surrounding an outer circumference of the spin head, a first ejection member having a first nozzle configured to discharge a first chemical to the substrate located in the spin head, and a second ejection member having a second nozzle configured to discharge a second chemical of the same chemical composition as that of the first chemical to the substrate located in the spin head.

公开(公告)号：US11280753B2

公开(公告)日：2022-03-22

申请号：US16781039

申请日：2020-02-04

Applicant: Samsung Electronics Co., Ltd. ,  SEMES Co., Ltd.

Inventor： Daesung Jung ,  Heehwan Kim ,  Jiyoung Lee ,  Jongmin Song ,  Sangyoon Soh

IPC: G01N27/30 ,  H01L21/20 ,  H01L21/67 ,  G01N27/60 ,  G01R19/00 ,  H01L21/66

Abstract: Sensors for detecting a substitution between chemicals may include an upper electrode and an electrical signal measurement circuit. A first chemical and a second chemical may be sequentially applied to the upper electrode. A triboelectrification may be generated between the upper electrode and the first and second chemicals to flow different electrical signals through the upper electrode. The electrical signal measurement circuit may measure the electrical signals to detect the substitution between the first and second chemicals. Thus, the second chemical may be applied to a semiconductor substrate from the substitution timing so that an original function of the second chemical may be maintained without a delay of the time for fabricating a semiconductor device.

公开(公告)号：US10707101B2

公开(公告)日：2020-07-07

申请号：US15677321

申请日：2017-08-15

Applicant: SEMES CO., LTD.

Inventor： Heehwan Kim ,  Sul Lee

IPC: H01L21/67 ,  H01L21/687

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus including a spin head configured to support the substrate, a nozzle configured to discharge a chemical to the substrate located on the spin head, a first passage configured to supply a first chemical, a chemical property of which is the same as the chemical, a second passage configured to supply a second chemical, a chemical property of which is the same as the first chemical, and a discharge passage connecting the first passage and the second passage, and the nozzle.