THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF
    1.
    发明申请
    THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF 审中-公开
    薄膜晶体管及其制造方法

    公开(公告)号:US20130200372A1

    公开(公告)日:2013-08-08

    申请号:US13795526

    申请日:2013-03-12

    Abstract: The present invention provides a structure of the TFT in which a current-voltage characteristic can be improved. The present invention refers to a thin film transistor comprising a lamination layer wherein a first conductive film, a first insulating film and a second conductive film are sequentially laminated, a semiconductor film formed so as to be in contact with the side surface of the lamination layer, and a third conductive film covering the semiconductor film through a second insulating film. The first conductive film and the second conductive film are a source electrode and a drain electrode, and a region which is in contact with the first insulating film and the third conductive film is a channel forming region in semiconductor film, and the third conductive film is a gate electrode.

    Abstract translation: 本发明提供了可以提高电流 - 电压特性的TFT的结构。 本发明涉及一种薄膜晶体管,其包括层叠层,其中依次层叠第一导电膜,第一绝缘膜和第二导电膜,形成为与层叠层的侧表面接触的半导体膜 以及通过第二绝缘膜覆盖半导体膜的第三导电膜。 第一导电膜和第二导电膜是源电极和漏电极,与第一绝缘膜和第三导电膜接触的区域是半导体膜中的沟道形成区域,第三导电膜是 栅电极。

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