公开(公告)号：US20240345468A1

公开(公告)日：2024-10-17

申请号：US18750609

申请日：2024-06-21

Applicant: SK enpulse Co., Ltd.

Inventor： Hyung-joo LEE ,  Kyuhun KIM ,  JiYeon RYU ,  INKYUN SHIN ,  Seong Yoon KIM ,  Suk Young CHOI ,  Suhyeon KIM ,  SUNG HOON SON ,  Min Gyo JEONG

IPC: G03F1/32

CPC classification number: G03F1/32

Abstract: A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 20 of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 20 of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1.





AI
⁢
1

=


XM
⁢
1


XQ
⁢
1






XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

公开(公告)号：US20240192584A1

公开(公告)日：2024-06-13

申请号：US18080186

申请日：2022-12-13

Applicant: SK enpulse Co., Ltd.

Inventor： Hyung-joo LEE ,  Kyuhun KIM ,  GeonGon LEE ,  Seong Yoon KIM ,  Suk Young CHOI ,  Suhyeon KIM ,  Sung Hoon SON ,  Min Gyo JEONG ,  Inkyun SHIN

IPC: G03F1/50 ,  G02F1/00 ,  G02F1/1335 ,  G03F1/60 ,  G03F1/80 ,  H01L21/285

CPC classification number: G03F1/50 ,  G02F1/0063 ,  G02F1/133512 ,  G03F1/60 ,  G03F1/80 ,  H01L21/28568

Abstract: A blank mask includes a light-transmitting substrate; and a light-shielding film, disposed on the light-transmitting substrate, including a first light-shielding layer and a second light-shielding layer disposed on the first light-shielding layer. The second light-shielding layer includes at least one of a transition metal, oxygen, or nitrogen, or any combination thereof. A reflectance of a surface of the light-shielding film with respect to light having a wavelength of 193 nm is 20% or more and 40% or less. A hardness value of the second light-shielding layer is 0.3 kPa or more and 0.55 kPa or less.