公开(公告)号：US20190224610A1

公开(公告)日：2019-07-25

申请号：US16300434

申请日：2017-05-09

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renaat DIRKX ,  Juan Coloma González

IPC: B01D47/10 ,  B01D47/06 ,  B01D47/12 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01J2/04

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：US20160303502A1

公开(公告)日：2016-10-20

申请号：US15036714

申请日：2014-11-14

Applicant: STAMICARBON B.V.

Inventor： Brian Sayre HIGGINS

IPC: B01D47/12 ,  B03C3/013 ,  B01D47/05 ,  B01D47/10

CPC classification number: B01D47/12 ,  B01D47/05 ,  B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  B01D2247/04 ,  B01D2247/102 ,  B01D2247/103 ,  B01D2247/107 ,  B01D2251/506 ,  B01D2252/103 ,  B03C3/013 ,  C07C273/16

Abstract: Disclosed is a method for the removal of soluble particulate matter from a gas stream, such as urea dust from the off-gas of a finishing section of a urea production plant. The method comprises subjecting the off-gas to at least two quenching stages an aqueous quenching liquid. The quenching liquid used in a first, upstream quench stage, is allowed to have a higher concentration of dissolved particulate matter than the quenching liquid in the second, downstream quench stage. The quenched gas is led through a particle capture zone, typically comprising one or more of a wet scrubber, a Venturi scrubber, and a wet electrostatic precipitator.

Abstract translation: 公开了从尿素生产设备的精加工部分的废气中除去可溶性颗粒物质的方法，例如来自气流的尿素粉尘。 该方法包括使废气进入至少两个淬火阶段的水性骤冷液。 在第一，上游骤冷阶段中使用的淬火液体比第二，下游骤冷阶段中的淬火液体具有更高的溶解颗粒物质浓度。 骤冷气体通过颗粒捕集区，通常包括一个或多个湿式洗涤器，文丘里洗涤器和湿静电除尘器。

公开(公告)号：US20220184545A1

公开(公告)日：2022-06-16

申请号：US17684716

申请日：2022-03-02

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre HIGGINS

IPC: B01D47/12 ,  B01D47/10 ,  B01D47/06 ,  C07C273/16 ,  B01D47/05 ,  B03C3/013

Abstract: Disclosed is a method for the removal of soluble particulate matter from a gas stream, such as urea dust from the off-gas of a finishing section of a urea production plant. The method comprises subjecting the off-gas to at least two quenching stages an aqueous quenching liquid. The quenching liquid used in a first, upstream quench stage, is allowed to have a higher concentration of dissolved particulate matter than the quenching liquid in the second, downstream quench stage. The quenched gas is led through a particle capture zone, typically comprising one or more of a wet scrubber, a Venturi scrubber, and a wet electrostatic precipitator.

公开(公告)号：US20190388823A1

公开(公告)日：2019-12-26

申请号：US16563696

申请日：2019-09-06

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renatt DIRKX ,  Juan Coloma GONZÁLEZ

IPC: B01D47/10 ,  B01J2/04 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01D47/05 ,  B01D47/06 ,  B01D47/12 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).

公开(公告)号：US20170320816A1

公开(公告)日：2017-11-09

申请号：US15495667

申请日：2017-04-24

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renaat DIRKX ,  Juan Coloma GONZÁLEZ

IPC: C07C273/16 ,  B01D47/10 ,  B01D47/06 ,  B01D47/12 ,  B01D47/05

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).