Abstract:
A display device includes a first transistor including a first transistor including a light blocking pattern on a substrate, an active pattern on the light blocking pattern, and a gate electrode on the active pattern, a second transistor configured to provide a data voltage to the first transistor in response to a gate signal, and a storage capacitor electrically connected to the gate electrode and the light blocking pattern, and including a first conductive pattern in a same layer as the light blocking pattern, a second conductive pattern on the first conductive pattern and overlapping the first conductive pattern, a third conductive pattern in a same layer as the gate electrode, overlapping the second conductive pattern, and electrically connected to the first conductive pattern, and a fourth conductive pattern on the third conductive pattern, overlapping the third conductive pattern, and electrically connected to the second conductive pattern.
Abstract:
A test circuit includes: a metal pattern disposed in a first area; a test gate driver disposed in a second area adjacent to the first area and including a plurality of test stages, each of which outputs a test gate signal; and a plurality of test gate lines overlapping the metal pattern in a plan view, connected to the plurality of test stages, respectively, each including a first metal line and a second metal line connected in series with the first metal line, and which receives the test gate signal.
Abstract:
A thin film transistor includes a gate electrode, an insulating layer disposed on the gate electrode, and an active layer disposed on the insulating layer, where the active layer includes a perovskite compound represented by the following Formula: AB(1-u)C(u)[X(1-v)Y(v)]3, where A is a monovalent organic cation, a monovalent inorganic cation, or any combination thereof, B is Sn2+, C is a divalent cation or trivalent cation, X is a monovalent anion, Y is a monovalent anion different from X, u is a real number greater than 0 and less than 1, and v is a real number greater than 0 and less than 1.
Abstract:
A method may be used for manufacturing a semiconductor element. The method may include the following steps: preparing a substrate; forming a semiconductor layer on the substrate, wherein the semiconductor layer includes crystallized two-dimensional layers; forming a source electrode and a drain electrode on the semiconductor layer; forming an semiconductor member by wet etching the semiconductor layer using sodium hypochlorite as an etchant, wherein the wet etching results in a residue; and removing the residue using purified water and an inert gas.
Abstract:
A display device includes a first transistor including a first transistor including a light blocking pattern on a substrate, an active pattern on the light blocking pattern, and a gate electrode on the active pattern, a second transistor configured to provide a data voltage to the first transistor in response to a gate signal, and a storage capacitor electrically connected to the gate electrode and the light blocking pattern, and including a first conductive pattern in a same layer as the light blocking pattern, a second conductive pattern on the first conductive pattern and overlapping the first conductive pattern, a third conductive pattern in a same layer as the gate electrode, overlapping the second conductive pattern, and electrically connected to the first conductive pattern, and a fourth conductive pattern on the third conductive pattern, overlapping the third conductive pattern, and electrically connected to the second conductive pattern.
Abstract:
Provided is a display device including a voltage line, a passivation layer disposed on the voltage line and having an undercut shape, a first connecting electrode disposed inside the undercut shape, a second connecting electrode electrically connecting the voltage line and the first connecting line, and a common electrode electrically connected to the voltage line through at least one of the first connecting electrode and the second connecting electrode.
Abstract:
A display device includes: a buffer layer including an inorganic insulating material, an active pattern disposed on the buffer layer and including a channel region and a first conductor region adjacent to the channel region, a gate insulating layer disposed on the buffer layer and the active pattern and including an inorganic insulating material, a gate electrode layer including a first electrode extending along a side surface of the gate insulating layer and including a first contact portion electrically contacting the first conductor region, and an oxygen supply layer including a first pattern disposed between the first electrode and the gate insulating layer, wherein the first pattern includes a first groove recessed from a side surface of to surround at least a part of the first contact portion in a plan view.
Abstract:
A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.