公开(公告)号：US09435022B2

公开(公告)日：2016-09-06

申请号：US13923186

申请日：2013-06-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hye-Yeon Shim ,  Chang-Soon Ji ,  Jong-Woo Lee ,  Do-Sung Kwon

IPC: C23C14/24 ,  C23C14/30 ,  C23C14/26 ,  H01L51/00 ,  H01L51/56

CPC classification number: C23C14/30 ,  C23C14/24 ,  C23C14/243 ,  C23C14/26 ,  H01L51/001 ,  H01L51/56

Abstract: A deposition source with uniform deposition characteristics includes a crucible in which a deposition material is disposed; a heat transfer member disposed on upper portions of the deposition material in the crucible; and an accommodation member for accommodating the heat transfer member and including a mesh plate.

Abstract translation: 具有均匀沉积特性的沉积源包括其中设置沉积材料的坩埚; 设置在所述坩埚中的所述沉积材料的上部的传热构件; 以及用于容纳传热构件并包括网板的容纳构件。

公开(公告)号：US08901008B2

公开(公告)日：2014-12-02

申请号：US13972497

申请日：2013-08-21

Applicant: Samsung Display Co., Ltd.

Inventor： Tae-Wook Kang ,  Ou-Hyen Kim ,  Chang-Soon Ji ,  Hyun-Lae Cho ,  Cheng-Guo An ,  Jeong-Yeol Lee ,  Jae-Mork Park

IPC: H01L21/302

CPC classification number: H01L51/0029 ,  H01J37/20 ,  H01J37/32091 ,  H01J37/32568 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/20235

Abstract: A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.

Abstract translation: 一种用于等离子体处理有机发光器件的电极表面的衬底等离子体处理设备。 衬底等离子体处理设备可以调节第一电极和衬底之间的距离并且调整第二电极和衬底之间的距离。