PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    2.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开
    光敏树脂组合物及其形成图案的方法

    公开(公告)号:US20140212809A1

    公开(公告)日:2014-07-31

    申请号:US14140350

    申请日:2013-12-24

    IPC分类号: G03F7/038 G03F7/30

    摘要: A photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof and an olefin-based unsaturated compound or a mixture of olefin-based unsaturated compounds, a photoinitiator represented by the following Chemical Formula 1 or 2, a multifunctional acrylate oligomer, a multifunctional monomer having an ethylenically unsaturated bond, and a melamine crosslinking agent.

    摘要翻译: 感光性树脂组合物包括通过使不饱和羧酸,不饱和羧酸酐或其混合物与烯烃系不饱和化合物或烯烃系不饱和化合物的混合物共聚形成的丙烯酸类共聚物,由以下化学式表示的光引发剂 式1或2,多官能丙烯酸酯低聚物,具有烯属不饱和键的多官能单体和三聚氰胺交联剂。

    POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME
    3.
    发明申请
    POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME 有权
    正性感光性硅氧烷树脂组合物和使用其形成的显示装置

    公开(公告)号:US20160195810A1

    公开(公告)日:2016-07-07

    申请号:US14924301

    申请日:2015-10-27

    IPC分类号: G03F7/039 H01L27/32 H01L51/00

    摘要: A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent, (R1)nSi(R2)4-n   [Chemical Formula 1] Si(R3)4   [Chemical Formula 2] wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, Ras may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.

    摘要翻译: 正型感光性硅氧烷树脂组合物包括a)通过进行水解和缩聚得到的硅氧烷共聚物,i)至少一种由以下化学式1表示的反应性硅烷和ii)至少一种由以下化学式表示的4-官能反应性硅烷 式2在催化剂下,共聚物具有1,000至20,000的聚苯乙烯换算的重均分子量Mw,b)1,2-醌二叠氮化合物,和c)溶剂,(R1)nSi(R2)4-n [ 化学式1] Si(R3)4 [化学式2]其中R 1可各自独立地为具有1至10个碳原子的烷基和具有6至15个碳原子的芳基的任何一个,R 2可以是具有 1至4个碳原子,苯氧基或乙酰氧基,Ras可各自独立地为具有1至4个碳原子的烷氧基,苯氧基或乙酰氧基中的任何一个,n可以是1至3的自然数。

    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    4.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 有权
    光敏树脂组合物及其形成图案的方法

    公开(公告)号:US20140234776A1

    公开(公告)日:2014-08-21

    申请号:US14161939

    申请日:2014-01-23

    IPC分类号: G03C1/56 G03F7/20

    摘要: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.

    摘要翻译: 感光性树脂组合物包括:包含含有选自不饱和羧酸和不饱和羧酸酐中的至少一种的第一单体的聚合产物和包含烯烃类不饱和化合物的第二单体的丙烯酸共聚物; 包含至少一种选自化学式1至4所示化合物的1,2-醌二叠氮化物-5-磺酸酯化合物的光敏组分; 偶联剂; 和溶剂,其中通过高效液相色谱法测定的感光组分中不对称化合物的总量大于或等于45面积%:其中R1是羟基或甲基,NQD是1,2 - 醌二叠氮化物5-磺酰基。