SENSOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS HAVING THE SAME
    1.
    发明申请
    SENSOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS HAVING THE SAME 审中-公开
    传感器基板,其制造方法和具有该传感器的显示装置

    公开(公告)号:US20150287752A1

    公开(公告)日:2015-10-08

    申请号:US14599695

    申请日:2015-01-19

    摘要: A sensor substrate includes a base substrate, and a sensing transistor and a switching transistor, which are on the base substrate. The sensing transistor includes a first gate electrode, an optical response pattern on the first gate electrode, a first source electrode and a first drain electrode on the optical response pattern and spaced apart from each other, a first oxide semiconductor pattern between the first source electrode and the optical response pattern, and a second oxide semiconductor pattern between the first drain electrode and the optical response pattern. The switching transistor includes a second gate electrode, a third oxide semiconductor pattern on the second gate electrode, and a second source electrode and a second drain electrode on the third oxide semiconductor pattern to be spaced apart from each other.

    摘要翻译: 传感器基板包括在基底基板上的基底基板和感测晶体管和开关晶体管。 感测晶体管包括第一栅电极,第一栅电极上的光响应图案,光响应图案上的第一源电极和第一漏电极,并且彼此间隔开;第一源电极 和光响应图案,以及第一漏电极和光响应图案之间的第二氧化物半导体图案。 开关晶体管包括第二栅电极,第二栅电极上的第三氧化物半导体图案,以及第三氧化物半导体图案上彼此间隔开的第二源电极和第二漏电极。

    APPARATUS AND METHOD OF TREATING SUBSTRATE
    2.
    发明申请
    APPARATUS AND METHOD OF TREATING SUBSTRATE 有权
    装置和处理基板的方法

    公开(公告)号:US20130248498A1

    公开(公告)日:2013-09-26

    申请号:US13714738

    申请日:2012-12-14

    IPC分类号: B23K10/00

    摘要: A substrate-treating apparatus includes a process chamber including a space therein, a lower electrode which is in the space of the process chamber and supports the substrate, an upper electrode which faces the lower electrode in the process chamber, a high frequency supply line which includes a feed point which applies a high frequency power to the lower electrode, and a modulator which asymmetrically supplies a dielectric substance to a lower portion of the lower electrode with reference to a center portion of the lower electrode.

    摘要翻译: 基板处理装置包括其中包括空间的处理室,位于处理室的空间中并支撑基板的下电极,与处理室中的下电极相对的上电极,高频电源线, 包括向下部电极施加高频电力的馈电点,以及相对于下部电极的中心部分将介电物质非对称地供给到下部电极的下部的调制器。