Abstract:
An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
Abstract:
A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.
Abstract:
A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.
Abstract:
An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
Abstract:
An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
Abstract:
An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
Abstract:
A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.