Abstract:
A pattering method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.
Abstract:
A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.
Abstract:
A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.
Abstract:
A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.
Abstract:
A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.
Abstract:
A method of manufacturing a wire grid polarizer is provided. The method includes: forming an electrical conductive layer on a substrate; forming a guide pattern layer on the electrical conductive layer, wherein the guide pattern layer includes two or more linear structures separated from one another; forming a fluorocarbon surface modification layer on each of the linear structures using a fluorine-based gas plasma treatment; and forming a neutral layer on the electrical conductive layer, wherein the neutral layer has a nonselective affinity with repeating units of a block copolymer.
Abstract:
A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.