HIGH-ELECTRON-MOBILITY TRANSISTOR
    4.
    发明申请
    HIGH-ELECTRON-MOBILITY TRANSISTOR 有权
    高电子移动晶体管

    公开(公告)号:US20140252368A1

    公开(公告)日:2014-09-11

    申请号:US14097709

    申请日:2013-12-05

    Abstract: A high-electron-mobility transistor (HEMT) device includes a plurality of semiconductor layers formed on a substrate, wherein a two-dimensional electron gas (2DEG) layer is formed in the semiconductor layers; an etch-stop layer formed on the plurality of semiconductor layers; a p-type semiconductor layer pattern formed on the etch-stop layer; and a gate electrode formed on the p-type semiconductor layer pattern.

    Abstract translation: 高电子迁移率晶体管(HEMT)器件包括形成在衬底上的多个半导体层,其中在半导体层中形成二维电子气(2DEG)层; 形成在所述多个半导体层上的蚀刻停止层; 形成在蚀刻停止层上的p型半导体层图案; 以及形成在p型半导体层图案上的栅电极。

    High-electron-mobility transistor
    7.
    发明授权
    High-electron-mobility transistor 有权
    高电子迁移率晶体管

    公开(公告)号:US09379227B2

    公开(公告)日:2016-06-28

    申请号:US14995622

    申请日:2016-01-14

    Abstract: A high-electron-mobility transistor (HEMT) device includes a plurality of semiconductor layers formed on a substrate, wherein a two-dimensional electron gas (2DEG) layer is formed in the semiconductor layers; an etch-stop layer formed on the plurality of semiconductor layers; a p-type semiconductor layer pattern formed on the etch-stop layer; and a gate electrode formed on the p-type semiconductor layer pattern.

    Abstract translation: 高电子迁移率晶体管(HEMT)器件包括形成在衬底上的多个半导体层,其中在半导体层中形成二维电子气(2DEG)层; 形成在所述多个半导体层上的蚀刻停止层; 形成在蚀刻停止层上的p型半导体层图案; 以及形成在p型半导体层图案上的栅电极。

    HIGH-ELECTRON-MOBILITY TRANSISTOR
    8.
    发明申请
    HIGH-ELECTRON-MOBILITY TRANSISTOR 有权
    高电子移动晶体管

    公开(公告)号:US20160126339A1

    公开(公告)日:2016-05-05

    申请号:US14995622

    申请日:2016-01-14

    Abstract: A high-electron-mobility transistor (HEMT) device includes a plurality of semiconductor layers formed on a substrate, wherein a two-dimensional electron gas (2DEG) layer is formed in the semiconductor layers; an etch-stop layer formed on the plurality of semiconductor layers; a p-type semiconductor layer pattern formed on the etch-stop layer; and a gate electrode formed on the p-type semiconductor layer pattern.

    Abstract translation: 高电子迁移率晶体管(HEMT)器件包括在衬底上形成的多个半导体层,其中在半导体层中形成二维电子气(2DEG)层; 形成在所述多个半导体层上的蚀刻停止层; 形成在蚀刻停止层上的p型半导体层图案; 以及形成在p型半导体层图案上的栅电极。

    HIGH ELECTRON MOBILITY TRANSISTOR DEVICE
    10.
    发明申请
    HIGH ELECTRON MOBILITY TRANSISTOR DEVICE 审中-公开
    高电子移动晶体管器件

    公开(公告)号:US20140253241A1

    公开(公告)日:2014-09-11

    申请号:US14077678

    申请日:2013-11-12

    Abstract: A high electron mobility transistor (HEMT) device includes a buffer layer on a substrate; a face-inversion layer on a part of the buffer layer; a plurality of semiconductor layers on the face-inversion layer and on the buffer layer; and a source electrode, a drain electrode, and a gate electrode on the plurality of semiconductor layers. The HMT device has a stable, normally Off characteristic.

    Abstract translation: 高电子迁移率晶体管(HEMT)器件包括在衬底上的缓冲层; 在缓冲层的一部分上的面反转层; 在面反转层上和缓冲层上的多个半导体层; 以及多个半导体层上的源电极,漏电极和栅电极。 HMT设备具有稳定的常闭特性。

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