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公开(公告)号:US20220360270A1
公开(公告)日:2022-11-10
申请号:US17734693
申请日:2022-05-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SANGDON JUNG , GYUSIK KIM , SEUNGJIN KIM , SEUNGHYUN OH , JIHWAN KIM
Abstract: A phase locked loop includes a phase detector outputting a first signal corresponding to a phase difference of a reference frequency signal and a division frequency signal, a charge pump amplifying a first signal to output a second signal, a loop filter filtering the second signal to output a third signal, a voltage-to-current converter receiving the third signal and outputting a fourth signal, a digital-to-analog converter outputting a fifth signal based on the fourth signal and a digital compensation signal, an oscillator outputting an output frequency signal having a frequency corresponding to the fifth signal, a divider dividing the frequency of the output frequency signal to output the division frequency signal and a compensation frequency signal, and an automatic frequency calibrator compensating for the voltage-to-current converter based on a difference between a frequency of the compensation frequency signal and a frequency of a reference frequency signal.
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2.
公开(公告)号:US20240258081A1
公开(公告)日:2024-08-01
申请号:US18241862
申请日:2023-09-02
Applicant: Samsung Electronics Co., Ltd.
Inventor: JIHWAN KIM , Nam Kyun KIM , HYUN BAE KIM , SEUNGBO SHIM , HYEONGMO KANG , KYUNG-SUN KIM , Daeun SON , JUHO LEE
IPC: H01J37/32
CPC classification number: H01J37/32715 , H01J37/32174 , H01J37/32568
Abstract: A substrate treatment apparatus may include a chucking stage supporting a substrate, a sinusoidal generator supplying a sinusoidal wave to the chucking stage, a non-sinusoidal generator supplying a non-sinusoidal wave to the chucking stage, and a mixer between each of the sinusoidal and non-sinusoidal generators and the chucking stage. The chucking stage may include a chuck body and a plasma electrode in the chuck body. The mixer may include a high pass filter between the sinusoidal generator and the plasma electrode, a low pass filter between the non-sinusoidal generator and the plasma electrode, and a band stop filter between the low pass filter and the plasma electrode.
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